SEARCH Articles Figures Tables AC sputtering chamber AES sputter depth profiling Aluminium Sputtered Anodized tantalum-sputtered glass Ar ion sputtering Ar+ sputtering Argon ion sputtering Argon sputtering Atomic SIMS, sputtering techniques Atomization sputter Auger sputter depth profiles Beam Sputtering Beam sources sputtering Carbon sputter coating Catalyst sputter coating Cathode sputtering Cathodic sputtering process Ceramic Target Magnetron Sputtering Cesium sputter ion source Cesium sputtering technique Chemical Surface Composition of Sputtered ZnO Films Chemistry Characterized by XPS and Sputtered Neutral Mass Spectroscopy Coating deposition magnetron sputtering Coating magnetron sputtering Coating methods sputtering Coating sputtered Collision sputtering Composites sputtering damage Conducting target sputtering DC magnetron sputtering technique Dc sputtering Dc-magnetron sputtering Defect mediated sputtering model Deposition by d.c. Magnetron Sputter with a Hot Boron Target Deposition magnetron sputter Deposition methods sputtering Deposition reactive sputter Deposition sputtering Depth profiling preferential sputtering Differential sputtering Diode sputtering Direct current sputtering Direct sputtering Direct-current magnetron sputtering Direct-deposition processing techniques sputtering Dual ion beam sputtering Dynamic SIMS, sputtering techniques Effects of Co-Sputtered Nickel in Different Atmospheres Effects of Co-Sputtering Effects of Sputtering Variables on Film Structure Electrode materials, sputtering Electrode materials, sputtering argon plasma Electrode materials, sputtering methane plasma Electron beam sputtering Electron beam sputtering technique Electron microscopy sputter coating Electron sputtering Electroplating sputtering process Energy distribution, of sputtered particles Evaporation and Sputtering Evaporation/sputtering, thin metal films Examples of Sputtered Films Fracture of Columnar Sputtered Film Gas flow sputtering Glow discharge sputter-atomization Gradient sputtering High Power Impulse Magnetron Sputtering High Power Impulse Magnetron Sputtering HIPIMS) High current density sputtering High-pressure sputtering system High-temperature sputtering History of ZnO Sputtering Hollow Cathode Sputtering Hot Filament-Assisted Sputtering Hydrogen plasma sputtering Input power, sputter rate Ion beam sputter coatings Ion beam sputtering Ion implantation sputtering Ion plasma sputtering Ion sputter etching Ion sputtering Ion sputtering process Ionized magnetron sputtering Jet-enhanced sputtering Kinetic sputtering Kinetically assisted potential sputtering Kinetics of Reactive Sputter Deposition Hysteresis Effect Knock-on sputtering Laser sputtering Linear cascade sputtering Lithography and Related Processes (Deposition, Sputtering, Other Relevant Technologies) Magnetron Sputtering Method Magnetron Sputtering of ZnO Magnetron sputtering Magnetron sputtering deposition Magnetron sputtering method, dense Magnetron sputtering system Materials surface: sputtering Metal carbides sputtering method Metals sputtering Minerals sputtering Molecular SIMS sputtering Molecular dynamics sputtering Monitoring sputtering rate Multiple layer sputtering Nanomaterials, synthesis sputtering Nitrides reactive sputtering Operating Parameters on Sputter Cleaning Other Sputtering Models Other Technologies for Sputter Deposition of ZnO Oxide electrodes sputtered Oxide films sputter-deposition Palladium plasma-sputtering Parallel Sputter Coating Penning sputtering Performance of Sputtered Coatings Physical Sputter Deposition Physical Sputter Etching Physical Sputtering and Chemical Etching Physical Sputtering of Liquid Metal Surfaces Physical magnetron sputtering Physical sputtering Physical sputtering mechanism Physical sputtering threshold Physical sputtering yield Physical vapor deposition sputtering Plasma sputtering, aluminum alloys Plasma technology sputtering/metallic deposition Plasmas: sputtering Platinum sputtering Polyatomic materials sputtering Potential sputtering Preferential sputtering, chemical Principle of Sputtering Processing methods sputtering RF Magnetron Sputtering of Fluoropolymer Films RF-sputtering Radiation damage and sputtering Radio Frequency (r.f.) Magnetron Sputtering Radio Frequency magnetron sputtering method Radio frequency RF magnetron sputtering Radio frequency RF sputtering Radio frequency magnetron sputtering Radio frequency magnetron sputtering deposition Radio frequency magnetron sputtering fluoropolymer film deposition Radio frequency magnetron sputtering process description Radio frequency sputtering Radiofrequency Sputtering Reactive Sputter Deposition Processes Reactive magnetron sputtering Reactive radio frequency sputtering Reactive sputtering Reactive-sputter etching Recoil sputtering Rf magnetron sputtering Rf-sputtered films Rotatable Target Magnetron Sputtering SNMS (sputtered neutral mass Schematic Diagram of a Typical R-F Sputtering System Screening sputtering Seed sputtering Self-sputtering Silicon sputtering Simultaneous Sputter Coating and LCVD Sites sputtering Sputter Sputter Cleaning of Cathode Surface Sputter Deposition of PTFE, PVDF. and FEP Sputter Deposition of ZnO onto CdS Sputter Deposition of cBN Films Sputter Deposition with Conducting Targets Sputter Yield Dependence on Substrate Sputter annealing Sputter beam Sputter cleaning Sputter cleaning cathode surface Sputter coater Sputter coaters Sputter coating Sputter damage Sputter deposition Sputter deposition alloys Sputter deposition applications Sputter deposition biased Sputter deposition collimated Sputter deposition composite materials Sputter deposition compounds Sputter deposition elements Sputter deposition graded structures Sputter deposition layered structures Sputter deposition processes Sputter deposition pulse power Sputter depth profiling Sputter desorption Sputter etching Sputter induced damage Sputter ion plating Sputter procedures Sputter profile Sputter pumps Sputter rate Sputter rate equations Sputter rate system pressure Sputter redeposition, sputtering Sputter source Sputter threshold Sputter yield Sputter-Ion Depth Profiling Sputter-Model Sputter-deposited Sputter-deposited Pt films Sputter-deposited films Sputter-depth profiles Sputter-induced reduction Sputter-initiated resonance-ionization Sputter-initiated resonance-ionization spectroscopy Sputtered Films Sputtered Material Sputtered Tantalum Membrane Sputtered absorption spectrum Sputtered amorphous silicon, hydrogen Sputtered atoms ionization Sputtered catalyst library Sputtered ion source Sputtered ions Sputtered metal-polyimide interface Sputtered neutral Sputtered neutral atom mass Sputtered neutral atom mass spectrometry Sputtered neutral mass spectrometry Sputtered neutral mass spectroscopy Sputtered neutral mass spectroscopy SNMS) Sputtered oxide films Sputtered particles, energy distribution Sputtered surface films Sputtering Sputtering Sputtering (electrical atomization Sputtering Materials Sputtering Variables Sputtering adhesion Sputtering alloy Sputtering angular distribution Sputtering atomic spectroscopy Sputtering boron carbides Sputtering boron nitrides Sputtering by Ion Impact Sputtering by Non-recycling Ions (Mixed Materials) Sputtering carbon nitrides Sputtering cathodic Sputtering chemical Sputtering composition changes Sputtering computer simulation Sputtering crater Sputtering definition Sputtering deposited energy Sputtering deposition systems Sputtering deposition-wet oxidation Sputtering diamond-like carbon films Sputtering dielectric film Sputtering discussion Sputtering effects, dynamic SIMS Sputtering efficiency Sputtering endurance Sputtering equilibrium Sputtering experiment Sputtering film structure Sputtering for Film Deposition Sputtering friction Sputtering glow discharge Sputtering hydrothermal synthesis Sputtering in SIMS Sputtering insertion materials Sputtering ion bombardment Sputtering ion source Sputtering ionization Sputtering materials factor Sputtering metallization process Sputtering method Sputtering of Alloys and Compounds Sputtering of Pure Elements Sputtering of Single-Element Targets Sputtering of ions Sputtering of metals Sputtering plants Sputtering preferential Sputtering preparation Sputtering process Sputtering process artifacts Sputtering process, and Sputtering pulsed mode Sputtering rate Sputtering rate, SIMS Sputtering reaction Sputtering simulations Sputtering solid electrolytes Sputtering sources Sputtering spectroscopy Sputtering sputter yield Sputtering steady state Sputtering system Sputtering target Sputtering target configurations Sputtering target fabrication Sputtering target materials Sputtering target purity Sputtering target specifications Sputtering techniques Sputtering thin film sensor fabrication Sputtering threshold Sputtering time Sputtering uniformity Sputtering yield Sputtering yields, definition Sputtering zinc oxide films Sputtering, Electron Bombardment, Oxide-Chloride Conversion Sputtering, SIMS Sputtering, SIMS characteristics Sputtering, SIMS matrix effect Sputtering, Superconducting Films Sputtering, description Sputtering, physical alloys Sputtering, physical compounds Sputtering, physical elements State of the Art in Industrial Magnetron Sputtering Structure of the Sputtered Coating Surface Erosion During Implantation Sputtering Surface analysis by resonance ionization of sputtered atoms Surface roughening, sputtering Surfaces chemical sputtering Surfaces physical sputtering Synthesis sputter deposition Target preparation sputtering The Sputtering Process Thermal sputtering Thickness Uniformity and Mass Efficiency in Sputtering Thin film production by the sputtering of metals Thin film technology magnetron sputtering Thin film technology sputtering Thin films sputtering Thin sputtering Thin-film sputter deposition Triode sputtering Typical problems that might be encountered when sputter profiling, and their solutions Unbalanced magnetron sputtering Vacuum deposition techniques sputtering Vacuum magnetron sputtering films Vacuum sputtered films Vacuum sputtering Vaporization sputter Volatilization sputtering Zinc oxide sputter deposition