Sputtering plants

The catalysts to be deposited are inserted into the sputter plant as the so-called targets. The shuttle carries the titer-plate and revolves below the metal targets (Figure 3.4). In every rotation up to three sublayers are deposited. For a binary system, the sublayer thickness was 10 nm in each revolution. The thickness gradients were realized by aperture orifices which shaped the particle beam (Figure 3.5). 

Figure 3.5 Details of sputtering plant for gradient sputtering (a single aperture orifice is shown in the lower right photograph) (source IMM).

For the dispersion measurements and for the coupled dispersion/reaction measurements, the same reaction plate was used. A 1.5 m long channel with a rectangular cross-section of 1 mm width and 0.5 mm depth was manufactured out of a 1.4571 steel plate (Figure 3.69). The plate was coated in a sputtering plant with a 300 nm layer of platinum. The reactants entered the channel through a 0.5 mm bore from below the plate. The reactants exited the channel through a similar bore in the cover plate. To allow long channels on the reaction plate, the channel was... 

All major functions of a plant, such as glass transport, control of the sputter processes and pump control, are carried out fully automatically. This is the only way to ensure high productivity along w/ith high product quality. 

Radiation damage Superconductivity of bombarded metals Variations of thin film properties Simulation of radiation damage e.g. in nuclear power plants Radiation Chemistry Ion sputtering Ion reflection Radiation decomposition of gases... 

Compound films such as oxide, nitride and carbide can be produced by reactive sputtering as mentioned above. Electrically non-conducting substances are processed by rf sputtering. Whether the noble gas ions required for sputtering originate from a gas discharge plasma in the plant, from special ion guns or from other set-ups does not have any influence on the choice of material. 

In evacuated coating plants, it is usual to mount the parts to be coated on rotating work holders permitting the uniform subsequent or simultaneous deposition of evaporated, sputtered or ion-plated deposits of any combination of metals or dielectric materials. The film thickness on the sample itself or on a test glass can be monitored optically by transmitted and/or reflected light using a photometer. Such instruments are commercially available with nearly all coating plant manufacturer. 

Eckstein W, Urbassek HM (2007) Computer simulation of the sputtering process in Sputtering by Particle Bombardment IV . In Behrisch R, Eckstein W (eds) Topics in applied physics, vol 110. Springer, Berlin, pp 21—31 EFDA (2005) Final report on conceptual power plant study, EFDA report EFDA-RP-RE-5.0 Erckmann W et al (2007) Fusion Sci Technol 53 279 Federici G, Skinner CH, Brooks JN, Coad JP, Grisolia G, Haasz AA, Hassanein A, Philipps V, Pitcher GS, Roth J, Wampler WR, Whyte DG (2001) Plasma-material interactions in current tokamaks and their implications for next step fusion reactors. Nucl Fusion 41 1967-2137... 

Spread Cold War anxiety. The hopes for atomic cars, planes, trains, and electricity had all sputtered out, save for occasional mention In educational comics and the fanciful illustrations of popular science magazines. And comic book creators could find no vocabulary to convey the authentic advances in nuclear medicine or the mixed potential of the nation s nuclear power plants. Almost by default, the comic book industry fell back on tales of (potential) apocalypse and post-holocaust survival adventures. The cartoon atomic world had become very solemn, indeed. 

H.6 If the flash unit in the example plant operates as an ideal sputter but with a non-negUgible Uquid holdup (e.g., 1,000 kg), what would be the effect on the response of... 

Slavcheva, E. Radev, I. Bliznakov, S. Topalov, G. Andreev, P. Budevski, E. (2007). Sputtered Iridium Oxide Films as Electrocatalysts for Water Splitting via PEM Electrolysis. Electrochim. Acta, Vol. 52, pp. 3889-3894 Soin, N. Roy, S.S. Karlsson, L. McLaughlin, J.A. (2010). Sputter Deposition of Highly Dispersed Platinum Nanoparticles on Carbon Nanotube Arrays for Fuel Cell Electrode Material. Diam. Relat. Mater., Vol. 19, pp. 595-598 Sundmacher, K. (2010). Fuel Cell Engineering Toward the Design of Efficient Electrochemical Power Plants. Ind, Eng. Chem, Res, Vol. 49, pp. 10159-10182... 

J.R. Mullaly, A crossed field discharge device for high rate sputtering, Dow chemical rocky flats plant report Rpt-1310, USAFC contract AT(29-1)-1106,1969. 

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