Magnetron Sputtering Method

Each of the above-mentioned methods to prepare Pd-based membranes has its own advantages and disadvantages, which are summarized in Table 4.2. A suitable method should be fitted to the desired membrane properties - such as membrane thickness, geometry, impurities, and so on - and the economy as well. ELP is more practical in commercial 

Method Membrane thickness Operation Economy Composition control Adhesion strength Substrate requirement 

Electroless plating High Easy (scale-up) Eow Hard Eow Strict 

Electroplating Medium Easy Eow Hard Eow High (metal, only) 

HVOES High Complicated High Easy High Eow 

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K.R. Zhang, F.R. Zhu, C.H.A. Huan, and A.T.S. Wee, Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method, J. Appl. Phys., 86 974—980, 1999. 

Zheng, S. K., Wang, T. M., Xiang, G. and Wang, C. (2001). Photocatalytic activity of nanostruc-tured Ti02 thin films prepared by dc magnetron sputtering method. Vacuum 62(4), 361-366. 

Yasui H. Tsuda Y. ITO thin films preparated by magnetron sputtering method using no target (effects of plasma conditions and substrate temperature on nO film properties). Nihon-Kikaigakkai-Ronbunsyu 1993 59 593-98. 

Then Hwang et al. [21] prepared plat type Pd membrane reactor using the magnetron sputtering method over a nickel metal support. They conducted WGS reaction using nickel catalyst. The nickel metal catalyst with a disc shape was placed on a membrane without a metal cage or mesh to hold the catalyst in the reactor. However the membrane did not work very well. 

Due to characteristic surface properties, PP is a very difficult material to metallize. Ideal for that pnirpose is the magnetron sputtering method described in papers (Ziaja Jaroszewski, 2011 Ziaja et al., 2010 Ziaja et al., 2008). Obtained coefficients of shielding effectiveness (SE) of popular composites based on PP/Me matrixes exceed up to 60dB (Me=Zn SE exceeds 60 dB, Me=Cu SE approx. 35 dB, Ti approx. 30 dB). 

Y. Makino and K. Nogi, Synthesis of pseudobinary Cr-Al-N films with B1 sructure by rf-assisted magnetron sputtering method. Surface Coatings Technology. 98 (1-3),1008-1012, (1998)... 

HoHeo C, Lee SB, Boo JH. Deposition of Ti02 thin films using RF magnetron sputtering method and study of their surface characteristics. Thin Solid Films 2005 475 183-8. 

Elena C, Gheorghe 1. Obtaining thin layers of ZnO with magnetron sputtering method. Int J Comp 2010 4(4) 243-50. 

Vanadium nitride thin film with the thickness of 400 nm was fabricated via the dc magnetron sputtering method from metallic vanadium target on glass substrate (61). 

Lin, C.R., Wei, D.H., Chang, C.K., Liao, W.H., 2011. Optical properties of diamond-like carhon films for antireflection coating by RF magnetron sputtering method. Physics Procedia 18, 46-50. 

A Shoji, S Kiryu, S Kohjiro. Superconducting properties and normal-state resistivity of singlecrystal NbN films prepared by a reactive rf-magnetron sputtering method. Appl Phys Lett 60 1624, 1992. 

B. Thermal Stability of TiC Films Coated by the Magnetron Sputtering Method... 

As an intermediate layer, W films with a thickness of 5 pm were coated on an Mo substrate by the magnetron sputtering method under the following conditions substrate temperature, 873 K pressure of Ar, 6.7 Pa RF power, 500 W. It is well known that Ar incorporation occurs during the formation of W by sputtering. In order to lower the Ar content to a level at which blisters do not form on heating in vacuum at high temperature, an additional heat treatment in a vacuum lower than 10 Pa was needed. 

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