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Vacuum magnetron sputtering films

Nagata A and Okayama H. Characterization of solid oxide fuel cell device having a three-layer film structure grown by RF magnetron sputtering. Vacuum 2002 66 523-529. [Pg.282]

L.J. Meng, A. Macarico, and R. Martins, Study of annealed indium tin oxide-films prepared by rf reactive magnetron sputtering, Vacuum, 46 673-680, 1995. [Pg.523]

Hoffman, D.W. (1994), Perspective on stresses in magnetron-sputtered thin films , Journal of Vacuum Science and Technology A, 12, 953-961. [Pg.238]

Ljungcrantz, H., Engstrom, C., Hultman, L., Olsson, M., Chu, X., Wong, M.S. and Sproul, W.D. (1998), Nanoindentation hardness, abrasive wear, and microstructure of TiN/ NbN polycrystalline nanostructured multilayer films grown by reactive magnetron sputtering , Journal of Vacuum Science and Technology A, 16, 3104-3113. [Pg.239]

Kanai, N., T. Nuida, K. Ueta, K. Hashimoto, T. Watanabe and H. Ohsaki (2004). Photocatalytic efficiency of Ti02/Sn02 thin film stacks prepared by DC magnetron sputtering. Vacuum, 74(3 1), 723-727. [Pg.432]

Zheng, S. K., Wang, T. M., Xiang, G. and Wang, C. (2001). Photocatalytic activity of nanostruc-tured Ti02 thin films prepared by dc magnetron sputtering method. Vacuum 62(4), 361-366. [Pg.512]

We prepared aluminium oxide films by radio frequency (r.f) magnetron sputtering fi om an aluminium oxide target in a dedicated vacuum chamber. To study the growth and structure of these films deposited on silicon oxide and films of DIP we used X-ray reflectivity, cross-sectional transmission electron microscopy (TEM) and atomic force microscopy (AFM) in contact mode. For further details on the preparation of the aluminium oxide films we refer to Refs. [112, 113]. [Pg.178]

C. Gautier, H. Moussaoui, F. Elstner and J. Machet, Comparative study of mechanical and structural properties of CrN films deposited by d.c. magnetron sputtering and vacuum arc evaporation. Surf Coat. Technol. 1996, 86-87, 254-262. [Pg.996]


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See also in sourсe #XX -- [ Pg.4 ]




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Vacuum sputtered films

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