Cathode sputtering

Fig. 2. Simple schematic lepiesentation of (a) vacuum evaporation and (b) cathodic sputtering.

Vacuum Deposition-also vapor deposition or gas plating the deposition of metal coatings by means of precipitation (sometimes in vacuum) of metal vapor onto a treated surface. The vapor may be produced by thermal decomposition, cathode sputtering or evaporation of the molten metal in air or an inert gas. 

Kathoden-dichte, /. cathode density, -fiache, /. cathode surface, -licht, n. cathode glow, -niederschlag, m. cathode deposit, -raum, m. cathode space, space aroimd the cathode, -rdhre, /. cathode-ray tube, -strahl, m. cathode ray. -strahlenbiindel. n. cathode beam, -strahlrbhre, /. cathode-ray tube, -strahlimg. /. cathode radiation, -strom, m. cathode current, -zerstaubimg, /. cathode sputtering. 

Zerstkubung, /, comminution, flne disintegration, atomization spatt-ering, scattering dispersion spraying, spray (of mercury) flouring (cathode) sputtering,... 

Cathode sputtering M is volatilised by d.c. arcing, followed by condensation on cool M2 1 cathode vapour 1 solid on M2 M Au M2 Se... 

Coatings of refractory carbides and nitrides and more recently carbon and DLC are used extensively in decorative applications on jewelry, eyeglasses, and similar products in attractive colors such as gold (TiN) and metallic grey, or charcoal (DLC, CrN, and TaN). They provide a surface which is hard and wear resistant, sweat resistant and, in the case of gold, less costly. They are usually applied by cathode sputtering and less frequently by CVD. 

Another study (200) presented IR data for a number of hydride and deuteride species. Using matrix-isolation spectroscopy in conjunction with a hollow-cathode, sputtering source (the apparatus for which is shown in Fig. 36), the IR-active vibrations of the diatomic hydrides and deuterides of aluminum, copper, and nickel were observed. The vibra-... 

Fig. 7.3 Schematic diagram of a high-performance cathode sputter arrangement...

An n-type region 8 is formed in a p-type HgCdTe substrate. A thin strip of metal is formed on an insulating layer 6 by thermal evaporation or cathode sputtering. The strip is enlarged by immersing the substrate in a bath of electrolyte thereby forming a terminal 9. The substrate is thinned to form a layer 10 and a mask 11 is formed from a mask layer 26. 

Cr-Ni Wet chemical etching Cathode sputtering Glass isotrope... 

As an illustration of the use of SEM, micrographs obtained from the characterization of silica materials are described here [47], This SEM study was carried out with a JEOL 5800 LV model SEM. The acceleration of the electron beam was 20 kV. The sample grains were glued with silver colloid to the sample holder and were coated at vacuum by cathode sputtering with a 30-40 am gold film [47], in order to make the nonconducting silica powder sample conductive. 

Kapton polyimide has been widely used in the electronic industry because of its low dielectric constant, good mechanical properties and high thermal stability. Many applications require good adhesion between Kapton polyimide film and metal. Various processes to improve adhesion of metal to Kapton polyimide have been reported in the literature. DeAngelo et al., (D describe a process to form metal oxides on the surface of polyimide to improve adhesion. Other efforts to improve adhesion of a metal layer involve roughening of the surface of polyimide substrate by methods such as cathodic sputtering (2), chemical attack (2., 1), and reactive ion etching (1,4). 

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