Synthesis sputter deposition

Whisker Film (30 nm) MOVPE Sublimation- recondensation Synthesis Sputter deposition... 

This paper consists of three parts. The first part describes the high pressure synthesis of bimetallic compounds of NbN and MN where M is a Group 13 metal such as Al, Ga, or In. The second part discusses crystal structure investigations of a series of alkaline earth and transition metal nitrides, carried out to understand the bonding surrounding the transition metals. The third part describes the preparation of new metastable transition metal nitride and their solid solutions by rf-sputter deposition. 

Ku CK, Ho CH, Lee YD. Synthesis of polyimides containing pyridine or triazole moiety to improve their adhesion to sputter-deposited copper. J Adhes Sci Tech 2005 19(11) 909-25. 

Moreover, recent methods for the synthesis of MNPs in ILs, such as sputtering deposition and phase transfer, can also be mentioned. In sputtering deposition, the bombardment of a metal foil surface with energetic gaseous ions causes the physical ejection of surface atoms and/or small clusters that are stabilized by the IL [19, 20]. Phase transfer consists of the preparation of MNPs in water or organic solvents, which are then transferred to an IL phase [21-23]. These methods afford stabilized MNPs in ILs that are efficient catalysts for several reactions. 

Figure 1.4 Microreactors with sputter-deposited catalysts (a) chip (63 X 25 mm) with Ag film for oxidative dehydrogenation of 3-methyl-2-buten-1-ol to aldehyde (464 °C) (b) chip (3x1 cm) containing Pt, Fe or Co for (de)hydrogenation of cyclohexene (up to 250°C) and synthesis gas methanation (up to 300°C). Reprinted from [31], Copyright 2004, and [35], Copyright 2003, with permission from Elsevier.

Single or multiple layers of TiAlOx, AI2O3, TiA10x/Al203, and T1O2/AI2O3 were synthesized by magnetron sputter-deposition techniques, and more recently by atomic layer (ALD) deposition (see details of oxide layer synthesis in the ehapter Microchip-Embedded Capacitors for Implantable Neural Stimulators). 

Single-step synthesis of gold-silver alloy nanoparticles in ionic liquids by a sputter deposition technique. Chemical Communication, No.6, (February 2006), pp. 691-693, ISSN 1359-7345... 

Suzuki, T., Okazaki, K, Kiyama, T., Kuwabata, S. Torimoto, T. (2009). A Facile Synthesis of AuAg Alloy Nanopartides Using a Chemical Reaction Induced by Sputter Deposition of Metal onto Ionic Liquids, Electrochemistry T7 636-638. 

Sputter deposition onto ionic liquids Simple and clean synthesis of highly dispersed ultrafine metal nanoparticles, AppZ, Phys. Lett. 89 243117/1-3. 

Jayaraman et aL (1995b) deposited ultrathin Pd films (< 500 mn) on porous ceramic substrates using the sputter deposition technique. The following two parameters were found to be most critical to the synthesis of the gas-tight metal-ceramic composite substrate type (surface roughness) and deposition temperature. Fairly gas-tight Pd films with good adhesion could be coated on sol-gel derived fine pore y-alumina substrates but not on coarse a-alumina substrates. Poor adhesion between the coated film and the... 

Up to the present, a number of conventional film preparation methods like PVD, CVD, electro-chemical deposition, etc., have been reported to be used in synthesis of CNx films. Muhl et al. [57] reviewed the works performed worldwide, before the year 1998, on the methods and results of preparing carbon nitride hlms. They divided the preparation techniques into several sections including atmospheric-pressure chemical processes, ion-beam deposition, laser techniques, chemical vapor deposition, and reactive sputtering [57]. The methods used in succeeding research work basically did not... 

The synthesis of MNCGs can be obtained by sol-gel, sputtering, chemical vapor-deposition techniques. Ion implantation of metal or semiconductor ions into glass has been explored since the last decade as a useful technique to produce nanocomposite materials in which nanometer sized metal or semiconductor particles are embedded in dielectric matrices [1,2,4,23-29]. Furthermore, ion implantation has been used as the first step of combined methodologies that involve other treatments such as thermal annealing in controlled atmosphere, laser, or ion irradiation [30-32]. 

Electrocatalytic activity of supported metal particles has been investigated on surfaces prepared in an ultrahigh vacuum (UHV) molecular beam epitaxy system (DCA Instruments) modified to allow high throughput (parallel) synthesis of thin-film materials [Guerin and Hayden, 2006]. The system is shown in Fig. 16.1, and consisted of two physical vapor deposition (PVD) chambers, a sputtering chamber, and a surface characterization chamber (CC), all interconnected by a transfer chamber (TC). The entire system was maintained at UHV, with a base pressure of 10 °mbar. Sample access was achieved through a load lock, and samples could be transferred... 

The talk will briefly review some of these developments ranging from high temperature equilibrium plasmas to cool plasmas, PECVD, ion implantation, ion beam mixing and ion assisted etching and deposition. Brief consideration will also be given to sputtering and ionised cluster beam deposition techniques in inorganic synthesis. 

It should also be mentioned here that a number of publications deal with the true parallel synthesis of inorganic solids by sputtering and chemical vapor deposition however, these approaches are of major use for other fields in materials science than for catalysis. For a broad overview of synthetic and screening efforts refer to [49],... 

Synthesis of nano-structured alloys by the inert gas evaporation technique A precursor material, either a single metal or a compound, is evaporated at low temperature, producing atom clusters through homogeneous condensation via collisions with gas atoms in the proximity of a cold collection surface. To avoid cluster coalescence, the clusters are removed from the deposition region by natural gas convection or forced gas flow. A similar technique is sputtering (ejection of atoms or clusters by an accelerated focused beam of an inert gas, see 6.9.3). 

The photoelectrochemical behavior of a given photoanode is dependent on its method of synthesis. Various methods, some of which we now briefly consider, such as anodic oxidation, spray pyrolysis, reactive sputtering and vapor deposition are commonly employed to make polycrystalline thin films. 

At the co-deposition of nanocomposite components formation of M/SC particles proceeds simultaneously with formation of a dielectric matrix, and the relationship between these processes determines the nanocomposite structure. This problem has been in detail investigated for the case of M/SC nanoparticles formation in polymer matrices. Synthesis of nanocomposite films by simultaneous PVD of polytetrafluoroethylene (PTFE) and Au has been carried out in works [62-64], Polymer and metal were sputtered under action of Ar ions and then the obtained vapors were deposited on substrates (quartz, glass, silica, mica, etc.) at various temperatures. Here, it is necessary to note that polymer sputtering cannot be considered as only physical process PFTE polymer chains destruct under action of high-energy ions, and formed chemically active low-molecular fragments are then deposited and polymerized on a substrate surface. 

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