Physical magnetron sputtering

Thermal spray, laser deposition, physical vapor deposition, and magnetron sputtering are physical processes that are used for fabrication of electrolyte thin films. Sputtering is a reliable technique for film deposition and is being used in industry... 

This chapter examines the deposition of fluorinated polymers using plasma-assisted physical vapor deposition. Ultrathin coatings, between 20 and 5000 nm have been produced, using RF magnetron sputtering. The method of coating, fabrication, and deposition conditions are described. 

Lindgren, T., J.M. Mwabora, E. Avendano, J. Jonsson, A. Hoel, C.G. Granqvist and S.E. Lindquist (2003). Photoelectrochemical and optical properties of nitrogen doped titanium dioxide films prepared by reactive DC magnetron sputtering. Journal of Physical Chemistry B, 107(24), 5709-5716. 

Magnetron sputtering, one type of physical vapor deposition (PVD) method, is a powerful and flexible method that can be used to coat virtually any surface with a wide range of materials. It removes atomized materials from a solid by high-energy bombardment of its surface layers with ions or neutral particles. Prior to the... 

Fig. 18.15 Ti02 films deposited by reactive DC magnetron sputtering (a) Top view and (b) cross-sectional view [reprinted with permission from Weinberger and Garber (1995), Copyright 1995, American Institute of Physics]...

Minami T., Sonohara H., Kakumu T. and Takata S., Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering. Thin Solid Films, 270 (1995) pp. 37-42. 

One of the chapters of this handbook has already made an in-depth discussion on luminescence of rare earth doped nanomaterials, presented by Liu and Chen (2007b). So in this chapter, we will focus on the chemical synthesis technology of inorganic rare earth nanomaterials, especially on the versatile solution-based routes, and recent discoveries and milestones in the synthesis and properties studies are systemically reviewed. The general physical synthesis routes, such as MOCVD, PLD, magnetron sputtering, would not be specifically mentioned in our chapter. 

In this paper, the structure, morphology and the mechanical properties of d.c. magnetron sputtered nanocomposites of carbon or CNX and nickel are investigated. The addition of a metallic component to the amorphous or fiillerene-like material aimed to create new structural and physical properties in this kind of materials. 

It has been shown that hardness of fine grain chromium films and coatings produced by physical evaporation, hollow cathode discharge and magnetron sputtering may reach the values of 15000 - 26000 MPa that is more 9-10 times higher in comparison with cast chromium [1-3],... 

Cunha L et al (2010) Ti-Si-C thin films produced by magnetron sputtering correlation between physical properties, mechanical properties and tribological behavior. J Nanosci Nanotechnol 10(4) 2926-2932... 

Various preparation methods have been employed to dope nitrogen into T1O2 either based on chemical reactivity (sol-gel synthesis, chemical treatments of the bare oxide, oxidation of titanium nitride, etc.) or on physical methods (ion implantation, magnetron sputtering) [16], These different procedures lead, at least in some cases, to materials with somewhat different chemical and physical properties. In addition to the preparation method, many studies have addressed the electronic states associated to the N-impurities including the questions of localized or delocalized states. 

Chemical methods of material processing were known for years, existing in parallel with physical and other methods of film deposition. Recent advances in electron microscopy and scanning nanoprobe microscopy (STM, ATM) have revealed that some of the materials produced by the chemical methods have distinctive nanocrystalline structure. Furthermore, due to the achievements of colloid chemistry in the last 20 years, a large variety of colloid nanoparticles have become available for film deposition. This has stimulated great interest in further development of chemical methods as cost-effective alternatives to such physical methods as thermal evaporation magnetron sputtering chemical and physical vapor deposition (CVD, PVD) and molecular beam epitaxy (MBE). 

BasUe et al. [46] studied the WGSR in a palladium membrane reactor and showed the importance of the membrane preparation method in obtaining high-quality membrane materials. Magnetron sputtering, physical vapour deposition and co-condensation techniques were applied to realize submicron palladium... 

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