Magnetron sputtering deposition

Wan, C. H., Lin, M. T., Zhuang, Q. H., and Lin, C. H. Preparation and performance of novel MEA with multicatalyst layer structure for PEFC by magnetron sputter deposition technique. Surface and Coatings Technology 2006 201 214-222. 

Kikuchi, H., Kitano, M., Takeuchi, M., Matsuoka, M., Anpo, M. and Kamat, P. V. (2006). Extending the photoresponse of Ti02 to the visible light region Photoelectrochemical behavior of Ti02 thin films prepared by the radio frequency magnetron sputtering deposition method. J. Phys. Chem. B 110(11), 5537-5541. 

Boyd, A.R., Meenan, B.J., and Leyland, N.S. (2006) Surface characterisation of the evolving nature of radio frequency (RF) magnetron sputter deposited calcium phosphate films after exposure to physiological solution. Surf. Coat. Technol., 200 (20/21), 6002 -6013. 

Surmeneva, M.A., Chaikina, M.V., Zaikovskiy, V.I., Pichugin, V.E, Buck, V., Prymak, O., and Epple, M. (2013) The structure of an rf-magnetron sputter-deposited silicate-containing hydroxyapatite-based coating investigated by high-resolution techniques. Surf. Coat. Technol., 218, 39 -46. 

One of the most investigated high Tc superconductors is YBa2Cu307 t (YBCO). The discovery of this superconductor initiated a worldwide effort to optimize the quality of thin films on different types of planar substrate using various deposition techniques, for example pulsed laser deposition, magnetron sputter deposition, co-evaporation and molecular beam epitaxy. It should be... 

Utilize direct current (DC) magnetron sputter-deposited multi-component catalyst layers. 

M. Anpo, M. Kitano, M. Takeuchi, M. Matsuoka, J.M. Thomas, Preparation of visible light-responsive Ti02 thin film photocatalysts by an RF magnetron sputtering deposition method and their photocatalytic reactivity . Chemistry Letters, 34, 616-618, (2005). 

Sutmeneva MA, et al. Effect of silicate doping on the structure and mechanical properties of thin nanostructured RF magnetron sputter-deposited hydroxyapatite films. Surf Coat Technol 2015 275 176-84. 

Magnetron sputtering Deposition Mesoporous Godhino etal. (2013) 2013... 

A sintered target of 1 at.% boron-doped Si Ge j (p-type) with the purity of 99.997% was used for the RF magnetron sputtering deposition of SiGe thin film (Reprinted with permission from Shin et al. (2006). Copyright 2006 Elsevier)... 

Yang R, Bonakdarpour A, Easton EB, Stoffyn-Egli P, Dahn JR. Co-C-N oxygen reduction catalysts prepared by combinatorial magnetron sputter deposition. J Electrochem Soc 2007 154 A275-82. 

Wan and Zhuang [51 ] proposed a novel layer-wise anode structure to improve the CO-tolerance ability and utilization efficiency of the catalyst. The layer-wise structure consists of an outer and an inner catalyst layer. The outer catalyst layer, acting as a CO barrier, is composed of two nano-Ru layers (0.06 mg cm ) by the magnetron sputtering deposition method and a PtsoRuso layer (0.10 mg cm ) by the screen-printing method on the GDL. The inner catalyst layer providing the hydrogen oxidation reaction is a pure Pt layer (0.07 mg cm ) prepared by the... 

Liao JD, Chen HJ, Chang CW, Chiu SM, Chen ZS. (2006) Thin-film photo-catalytic Ti02 phase prepared by magnetron sputtering deposition, plasma ion implantation and metal vapor vacuum arc source. Thin Solid Films 515 176-185. 

Figure 19.9 UV-Vis absorption spectra (in transmittance) of Ti02 thin films prepared on a quartz substrate by a RF magnetron sputtering deposition method at different substrate temperatures. Substrate temperatures in K UV-Ti02, 473 K Vis-Ti02, 873 K...

Takeuchi, M., Anpo, M., Hirao, T., Itoh, N., and Iwamoto, N. Preparation of Ti02 thin film photocatalysts working under visible light irradiation by applying a RF magnetron sputtering deposition method. Surf. Sci. Jpn. 2001,22, 561. 

Single or multiple layers of TiAlOx, AI2O3, TiA10x/Al203, and T1O2/AI2O3 were synthesized by magnetron sputter-deposition techniques, and more recently by atomic layer (ALD) deposition (see details of oxide layer synthesis in the ehapter Microchip-Embedded Capacitors for Implantable Neural Stimulators). 

Oxide films can be synthesized by magnetron sputter-deposition or more recently using atomic layer deposition (ALD), which provides a unique growth process capable of growing films one atomic layer at a time. 

Fig. 4 Schematic of magnetron sputter-deposition concept used to produce oxide films such as the high-K dielectric described in this chapter...

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