Radio Frequency r.f. Magnetron Sputtering

One of the first studies using r.f. magnetron sputtering performed by Cooley et al. (1992) investigated and compared the healing rates of bone around commercially pure titanium implants and titanium implants sputter-coated from 

HAp nanodomains and the subsequent crystallisation of the grain domains with a preferential orientation along the HAp [0 0 2] direction. 

The average coating nanohardness (11.6 1.7 GPa) was significantly higher than that of the uncoated Ti substrate (4.0 0.3 GPa), whereas no significant difference between the Young s moduli of the coatings (125 20 GPa) and the substrate (115 10 GPa) was found. 

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We prepared aluminium oxide films by radio frequency (r.f) magnetron sputtering fi om an aluminium oxide target in a dedicated vacuum chamber. To study the growth and structure of these films deposited on silicon oxide and films of DIP we used X-ray reflectivity, cross-sectional transmission electron microscopy (TEM) and atomic force microscopy (AFM) in contact mode. For further details on the preparation of the aluminium oxide films we refer to Refs. [112, 113]. 

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