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Radio frequency magnetron sputtering deposition

Kikuchi, H., Kitano, M., Takeuchi, M., Matsuoka, M., Anpo, M. and Kamat, P. V. (2006). Extending the photoresponse of Ti02 to the visible light region Photoelectrochemical behavior of Ti02 thin films prepared by the radio frequency magnetron sputtering deposition method. J. Phys. Chem. B 110(11), 5537-5541. [Pg.506]

Working principle of radio-frequency magnetron sputtering deposition. [Pg.499]

K.R. Zhang, F.R. Zhu, C.H.A. Huan, and A.T.S. Wee, Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method, J. Appl. Phys., 86 974—980, 1999. [Pg.522]

Ishizuka, S. O., Kato, S., Maruyama, T. and Akimoto, K. (2001). Nitrogen doping into Cu20 thin films deposited by reactive radio-frequency magnetron sputtering. Jpn. J. Appl. Phys. Part 1-Regular Papers Short Notes Review Papers 40(4B), 2765-2768. [Pg.506]

Chiou B.S., Hsieh S.-T., Wu W.-F. Deposition of indium tin oxide films on acrylic substrates by radio-frequency magnetron sputtering J. Am. Ceram. Soc. 1994 77 1740-44. [Pg.143]

Because of isotropic expansion of the particles/grains, amorphous thin-hlm silicon anodes typically perform better than crystalline thin hlms. Maranchi et al. [12, 72] demonstrated that 250-nm-thick amorphous silicon thin hlms deposited by radio-frequency magnetron sputtering on copper substrates achieved near theoretical capacity for a limited number of cycles. The authors stated that growth of... [Pg.485]

Figure 2 shows a radio frequency magnetron sputtering apparatus for the fabrication of the thin-film sensor shown in Figure 1. The substrate (2) which is engine frictional part is fixed onto the substrate holder (1) in the top of the sputter chamber. The target (3) consists of sputter materials such as AI2O3, Si02 and sensor alloys. The film was deposited under the conditions listed in Table 1. Figure 2 shows a radio frequency magnetron sputtering apparatus for the fabrication of the thin-film sensor shown in Figure 1. The substrate (2) which is engine frictional part is fixed onto the substrate holder (1) in the top of the sputter chamber. The target (3) consists of sputter materials such as AI2O3, Si02 and sensor alloys. The film was deposited under the conditions listed in Table 1.
Boyd, A.R., Meenan, B.J., and Leyland, N.S. (2006) Surface characterisation of the evolving nature of radio frequency (RF) magnetron sputter deposited calcium phosphate films after exposure to physiological solution. Surf. Coat. Technol., 200 (20/21), 6002 -6013. [Pg.230]

Radio frequency (RF) magnetron sputtering deposition technique... [Pg.118]


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Deposition magnetron sputter

Magnetron

Magnetron frequency

Radio frequency magnetron sputtering

Radio frequency magnetron sputtering fluoropolymer film deposition

Radio frequency sputtering

Radio, radios

Radio-frequency

Radio-frequency magnetron

Sputtered

Sputtering

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