Sputter deposition magnetron

One of the most investigated high Tc superconductors is YBa2Cu307 t (YBCO). The discovery of this superconductor initiated a worldwide effort to optimize the quality of thin films on different types of planar substrate using various deposition techniques, for example pulsed laser deposition, magnetron sputter deposition, co-evaporation and molecular beam epitaxy. It should be... 

TaN resistive films for hybrid circuits deposited by planar magnetron sputtering. 

Fig. 19 —Cross-sectional morphologies of (a) TiN coating with hardness of 26 GPa, and (b) TiN/Si3N4 coating with optimum Si content of 10.8 at. % and hardness of 47.1 GPa deposited by reactive magnetron sputtering.

Fig. 22—Friction coefficients between WC ball and TiN/Si3N4 nanocomposite coatings as function of the Si content. The coatings were deposited by reactive magnetron sputtering. The friction coefficients of the TiN/Si3N4 coatings were obtained under the load of 20 N. In the case of the TiN coating and the Si3N4 coating, the load is 5 N, because the two coatings will fail and peel off from the substrate under the load of 20 N.

Fig. 23—The cutting life of the uncoated drill and the drills deposited with TiN coating and TiN/Si3N4 nanocomposite coatings drilling holes on quenched AISI 420 stainless steel. The coatings were deposited by reactive magnetron sputtering.

Monaghan, D. R, Teer, D. G., Laing, K. C., Efeoglu, I., and Ar-nell, R. D., Deposition of Graded Alloy Nitride Films by Closed Field Unbalanced Magnetron Sputtering," Surf. Coat. Technol., Vol. 5 9,1993, pp. 21 -25. 

Wang, X., Martin, P. J., and Kinder, T. J., Optical and Mechanical Properties of Carbon Nitride Films Prepared by Ion-Assisted Arc Deposition and Magnetron Sputtering, Thin SolidFilms, o. 256, Ho. 1-2,1995,pp. 148-154. 

A 2-in diameter (5.1cm) magnetron sputter source (Kurt J. Lesker - Torus type magnetron source) was fed into the top of the deposition chamber and positioned 12 cm above a custom made ( 120 cm ) stainless steel (SS)... 

In addition to microwave plasma, direct current (dc) plasma [19], hot-filament [20], magnetron sputtering [21], and radiofrequency (rf) [22-24] plasmas were utilized for nanocrystalline diamond deposition. Amaratunga et al. [23, 24], using CH4/Ar rf plasma, reported that single-crystal diffraction patterns obtained from nanocrystalline diamond grains all show 111 twinning. 

Thermal spray, laser deposition, physical vapor deposition, and magnetron sputtering are physical processes that are used for fabrication of electrolyte thin films. Sputtering is a reliable technique for film deposition and is being used in industry... 

The deposition techniques that are suitable for the preparation of reproducible thin films of ITO include thermal evaporation deposition [12], magnetron sputtering [13,14], electron... 

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