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Rotatable Target Magnetron Sputtering

The concept of rotatable target magnetron (C-Mag) sputtering is shown in Fig. 5.31a. The target material is a water-cooled tube, which is attached to [Pg.225]

Further advantages are the higher degree of material utilization and the large material stock, which is raised by a factor of 4 compared with planar targets. Both factors enable long-term operation (up to 2 weeks uninterrupted) without maintenance, while planar cathodes have to be maintained each week. [Pg.226]

Fig. 5.32. Photographs of double magnetron planar (a) and rotatable (b) targets after long-term reactive sputtering of ZnO Al. The planar target is shown after 1,850kWh, the rotatable target after 11,500kWh (source Von Ardenne Anlagen-technik, Dresden)... Fig. 5.32. Photographs of double magnetron planar (a) and rotatable (b) targets after long-term reactive sputtering of ZnO Al. The planar target is shown after 1,850kWh, the rotatable target after 11,500kWh (source Von Ardenne Anlagen-technik, Dresden)...
Figure 7.6 Sputtering target configurations (clockwise) Planar DC diode, planar magnetron, S gun, hollow cylinder, spool, hemispherical, post, and rotating tubular magnetron... Figure 7.6 Sputtering target configurations (clockwise) Planar DC diode, planar magnetron, S gun, hollow cylinder, spool, hemispherical, post, and rotating tubular magnetron...
See other pages where Rotatable Target Magnetron Sputtering is mentioned: [Pg.225]    [Pg.225]    [Pg.226]    [Pg.690]    [Pg.211]    [Pg.19]    [Pg.211]    [Pg.497]    [Pg.91]    [Pg.450]    [Pg.127]    [Pg.128]    [Pg.37]    [Pg.542]    [Pg.1141]    [Pg.904]   


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