Sputtering deposition-wet oxidation

A two-step method, sputtering deposition-wet oxidation, was therefore developed by the present authors in an attempt to prepare low-dimensional ZnO nanostructures. In this technique, Zn precursor films prepared by magnetron sputtering were used to grow ZnO nanostructures. During deposition, the sputtering conditions, such as gas pressure, power and time, were fully controlled. These precursor films were then subjected to oxidation treatment in which the temperature, time and atmosphere were under accurate... 

A new two-step method, partial reactive sputtering deposition-wet oxidation, has been developed by the present authors. They found that modulation of precursors in the sputtering step can provide more opportunities for control of the structural and functional properties of the thermally grown oxides. This technique may also open a new way to fabricate porous ZnO films [205,218]. The innovative part of this processing is that a partial reactive deposition is introduced. 

Typical photoluminescence spectra of ZnO films prepared by sputtering deposition-wet oxidation. 

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