Ion beam sputter coatings

Kim etal. (1998) deposited about 0.5 pm thick homogeneous and dense hydroxyapatite coatings by IBAD on a-alumina substrates. The ACP layer crystallised to dense HAp after annealing at 500 °C for 2 h and immersion in deionised water for 72 h at room temperature. The adhesive strength between HAp and the a-alumina substrate was measured by a scratch test and the critical load was found to be around 43 N (4300 gf). The ion-beam sputtered coatings were used as control samples. The adhesion was found to be worse for IBSD than for IBAD. Indeed, using IBSD the critical load of HAp on alumina was measured to be only about 39 N (3900 gf). 

Clay and Peace [275] compared evaporative, sputtering and ion beam sputter coatings and showed that IBS produces a fine grained, uniform film of gold. In a comprehensive review of recent advances in metal coatings Echlin [276]... 

Abstract The principles of coatings to either enhance reflectivity of mirrors or to enhance transmission of glass optics are described. Then the ion assisted deposition and ion beam sputtering techniques are addressed. Performances of these technique-sand their limitations are illustrated with the characteristics of the VIRGO mirrors coated at LMA. The importance of metrology is emphasized. 

Keywords dielectric coatings, metallic coatings, deposition, ion beam sputtering, ion as-... 

Other coating processes involving fluoridated apatite have been investigated to improve the long-term adhesion and promote osteointegration of cementless titanium-based metal implants pulsed laser deposition, electron beam deposition and ion beam sputter deposition techniques, and sol-gel methods, for example. They lead to fluor-containing calcium phosphates (apatites in most cases) with different compositions and crystallinity states. 

Various sputtering methods are used for the deposition of diamond like films (refer to Figure 14). It is possible to coat a substrate with a diamond like film by ion beam sputtering using the same ion sources that are used for (non-mass-analyzed) direct ion beam deposition. 

The A1 electrodes were coated with a thin (about 80 nm 25 nm) layer of TiOj, also by ion beam sputtering of titanium and thermal oxidation afterwards. This oxidation was performed in an glass furnace which was heated up to 500 °C in ambient atmosphere. After two hours of monotonic heating, the temperature was held constant for an hour. After that the furnace was turned off. For a slightly faster cooling the door of the furnace was opened. 

Lu TR, Kuo CT, Yang JR, Chen LC, Chen KH, Chen TM. High purity nano-crystaUine carbon nitride films prepared at ambient temperature by ion beam sputtering. Snrf Coat Technol 1999 115 116-22. 

There are a variety of other coating methods. Three of these are the electron beam (E beam) technique. Penning sputtering and saddle field ion beam sputtering. The methods require more... 

Fig. 4.25 Micrographs of a commercial stretched polypropylene membrane (Celgard 2400) prepared for microscopy by different metal coating devices are shown by SEI in a dedicated SEM (A, B) and in an AEM (C, D) (A) Au-Pd sputter coating, (B) ion beam sputtered with Au (same magnification as in (A)), (C) Au-Pd evaporation and (D) ion beam sputtering with Au (same magnification as (C)).

Fig. 4.26 FESEM image of Celgard 2500 taken at 5 kV with c. 3 nm Pt coated by ion beam sputtering.

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