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High current density sputtering

Figures 1.34-1.36 compares the performance of these two electrode types. The sputtered film electrodes show good activity towards Oj reduction. This shows that the sputter-deposited layer are as active as the highly dispersed Pt in the ETEK electrodes. However, no enhancement is observed at high current densities. This behavior is understood as follows. The diffusion of O2 to the surface in the thin film electrode occurs through the layer of Vulcan XC-72 carbon which is quite similar to that through the ETEK electrodes. Therefore, eliminating this sub-layer of carbon is a better approach to implementing the thin film electrodes. Figures 1.34-1.36 compares the performance of these two electrode types. The sputtered film electrodes show good activity towards Oj reduction. This shows that the sputter-deposited layer are as active as the highly dispersed Pt in the ETEK electrodes. However, no enhancement is observed at high current densities. This behavior is understood as follows. The diffusion of O2 to the surface in the thin film electrode occurs through the layer of Vulcan XC-72 carbon which is quite similar to that through the ETEK electrodes. Therefore, eliminating this sub-layer of carbon is a better approach to implementing the thin film electrodes.

See other pages where High current density sputtering is mentioned: [Pg.126]    [Pg.126]    [Pg.37]    [Pg.126]    [Pg.33]    [Pg.99]    [Pg.114]    [Pg.35]    [Pg.36]    [Pg.40]    [Pg.4]    [Pg.121]    [Pg.244]    [Pg.569]    [Pg.249]    [Pg.405]    [Pg.390]    [Pg.322]    [Pg.312]    [Pg.310]    [Pg.375]    [Pg.545]    [Pg.397]    [Pg.399]    [Pg.519]    [Pg.125]    [Pg.241]    [Pg.218]    [Pg.264]    [Pg.520]    [Pg.519]    [Pg.397]    [Pg.399]    [Pg.36]    [Pg.407]    [Pg.183]    [Pg.277]    [Pg.290]    [Pg.233]    [Pg.363]    [Pg.328]    [Pg.852]    [Pg.457]    [Pg.458]    [Pg.158]    [Pg.141]    [Pg.241]    [Pg.99]    [Pg.17]    [Pg.230]   


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