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Plasma sputtering

A few mm in direct plasma sputtering 0.1—10 pm using separate, focused primary ion-beam sputtering... [Pg.43]

Chemical alternation of the surface layer and deposition of a new layer on top of the silicone mbber can be achieved by physical techniques. For the inert surface of silicone rubber, the former requires the generation of high-energy species, such as radicals, ions, or molecules in excited electronic states. In the latter case, coatings of atoms or atomic clusters are deposited on polymer surfaces using technique such as plasma (sputtering and plasma polymerization) or energy-induced sublimation, like thermal or electron beam-induced evaporation. [Pg.243]

Caillard A, Coutanceau C, Brault P, Mathias J, Leger JM. 2006. Structure of Pt/C and PtRu/C catalytic layers prepared by plasma sputtering and electric performance in direct methanol fuel cells (DMFC). J Power Sources 162 66-73. [Pg.368]

Plasma spraying, 21 483 Plasma spray MCrAlY coatings, 13 507 Plasma sputtering, 24 730 Plasma tube, 14 655 Plasmid cloning experiments, passenger sequence in, 12 503-504... [Pg.714]

Increased control of film composition, structure and size can be achieved by limiting the rate of reaction. This is possible using gas phase deposition where the amount of reactant is relatively low. Gas phase deposition loosely covers any hybridization strategy where at least one of the hybrid components is in the gas phase. This includes chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) as well as various plasma, sputtering and evaporation processes. [Pg.148]

Schematic of the plasma sputtering reactor. (Reproduced from Kadjo, A. J. J. et al. Journal of Power Sources 2007 172 613-622. With permission from Elsevier.)... Schematic of the plasma sputtering reactor. (Reproduced from Kadjo, A. J. J. et al. Journal of Power Sources 2007 172 613-622. With permission from Elsevier.)...
Caillard, A., Brault, R, Mathias, J., Charles, C., Boswell, R. W., and Sauvage, T. Deposition and diffusion of platinum nanoparticles in porous carbon assisted by plasma sputtering. Surface and Coatings Technology 2005 200 391-394. [Pg.103]

Considerable work in the area of general research on fuel cells, materials and components was reported by Australia, where the government-sponsored fuel cell R D program has made efficiency improvements in fuel cell electrodes by the formation of platinum nano-clusters in porous carbon by high density plasma sputter mechanisms. Initial experiments on the plasma sputter deposition of platinum onto a porous film has shown great promise and aggregates of platinum were detected in the film with a density profile which decreased away from the surface exposed to the plasma. [Pg.108]

Berthet, A., Thomann, A. L., Aires, F. J. C. S., Brun, M., Deranlot, G, Bertolini, J. C., Rozenbaum, J. P., Brault, P., and Andrezza, P., Comparison of bulk Pd/(Bulk SiC) catalysts prepared by atomic beam deposition and plasma sputtering decomposition Characterization and catalytic properties. J. Catal. 190, 49 (2000). [Pg.43]

Keywords structure of films, films of zirconia-based solid electrolytes, ion plasma sputtering, scanning electron microscope, transmission electron microscopy. [Pg.567]

The structure and the formation of films of a zirconia-based solid electrolyte, which were prepared by ion plasma sputtering, were studied using scanning and transmission electron microscopy methods. [Pg.567]

The transmission electron microscopy was used to study the initial stage of the formation of the films of zirconia-based solid electrolytes, which were prepared by ion plasma sputtering on a glass-ceramic substrate having a thin ( 10 nm) layer of amorphous carbon. [Pg.568]

The investigated samples were stainless steel (12X18H10T) membranes with diameter 40 mm and thickness 0.2 mm. Some part of samples was covered by thin titanium nitride film plotted by vacuum ion-plasma sputtering. The typical thickness of the covering was 10 micrometers. Stehiometry of thin-film coats was explored by x-ray analysis method and turned out to be close to ideal. [Pg.672]


See other pages where Plasma sputtering is mentioned: [Pg.116]    [Pg.384]    [Pg.148]    [Pg.86]    [Pg.261]    [Pg.35]    [Pg.109]    [Pg.694]    [Pg.165]    [Pg.116]    [Pg.213]    [Pg.12]    [Pg.213]    [Pg.214]    [Pg.567]    [Pg.567]    [Pg.15]    [Pg.165]    [Pg.567]    [Pg.567]    [Pg.139]    [Pg.326]    [Pg.326]    [Pg.326]    [Pg.326]   
See also in sourсe #XX -- [ Pg.463 ]




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