Ion plasma sputtering

Keywords structure of films, films of zirconia-based solid electrolytes, ion plasma sputtering, scanning electron microscope, transmission electron microscopy. 

The structure and the formation of films of a zirconia-based solid electrolyte, which were prepared by ion plasma sputtering, were studied using scanning and transmission electron microscopy methods. 

The transmission electron microscopy was used to study the initial stage of the formation of the films of zirconia-based solid electrolytes, which were prepared by ion plasma sputtering on a glass-ceramic substrate having a thin ( 10 nm) layer of amorphous carbon. 

The investigated samples were stainless steel (12X18H10T) membranes with diameter 40 mm and thickness 0.2 mm. Some part of samples was covered by thin titanium nitride film plotted by vacuum ion-plasma sputtering. The typical thickness of the covering was 10 micrometers. Stehiometry of thin-film coats was explored by x-ray analysis method and turned out to be close to ideal. 

The last reaction is particularly convenient for the passivation of device surfaces because of the low temperature required. Low-temperature layers can also be formed by the vacuum evaporation of Si02 powder or by ion-plasma sputtering of Si in an argon-oxygen mixture. The anodic oxidation of silicon in an ethylene glycol solution of KNO3 and various chemical oxidation reactions of Si (e.g., in H2O2) can also be used. 

The diffusion of P into amorphous material, produced by ion-plasma sputtering, was studied. It was found that the temperature dependence of the diffusivity was described by ... 

A few mm in direct plasma sputtering 0.1—10 pm using separate, focused primary ion-beam sputtering... 

Chemical alternation of the surface layer and deposition of a new layer on top of the silicone mbber can be achieved by physical techniques. For the inert surface of silicone rubber, the former requires the generation of high-energy species, such as radicals, ions, or molecules in excited electronic states. In the latter case, coatings of atoms or atomic clusters are deposited on polymer surfaces using technique such as plasma (sputtering and plasma polymerization) or energy-induced sublimation, like thermal or electron beam-induced evaporation. 

The ion source is an essential component of all mass spectrometers where the ionization of a gaseous, liquid or solid sample takes place. In inorganic mass spectrometry, several ion sources, based on different evaporation and ionization processes, such as spark ion source, glow discharge ion source, laser ion source (non-resonant and resonant), secondary ion source, sputtered neutral ion source and inductively coupled plasma ion source, have been employed for a multitude of quite different application fields (see Chapter 9). 

Alternative approaches for GaN MBE, involving gaseous precursors which are sufficiently reactive to achieve growth without dissociation by plasmas, have been developed. RMBE has the advantages of being less complicated and therefore less expensive, and easy to control, and it is inherently free of ions and sputtering effects. 

Figure 1. SIMS Surface surveys of (a) as-recieved polyimide and (b) after RF sputter cleaning in Ar ion plasma (200W,30min)...

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