Cathodic sputtering

Disks as sputtering cathodes (high purity W, W-Ti, W-Si , MoW). Sputter targets are used to produce thin layers in integrated circuits (VLSI) by PVD. Recently, W-Mo sputter targets were used for the manufacture of flat panel displays [7.19]. 

Thickness uniformity of sputtered films is also of great practical importance. Model calculations exist which determine thickness distributions in the substrate plane below the sputter cathodes not only for static but also for moving substrates... 

Above a rectangular sputter cathode, the total rate at an observed point in the substrate plane is obtained by integration over all elementary sources, that is the erosion zone of the cathode ... 

Additional possible heating methods include high-frequency induction heating and cathode sputtering. However, one should remember that deposits obtained from a vapor and from a sputtered cathode differ somewhat in structure [14]. 

Schwanitz B, Rabis A, Horisberger M et al (2012) Sputtered cathodes for polymer electrolyte fuel cells insights into potentials, challenges and limitations. Chimia (Aarau) 66 110-119... 

Figure 2 presents the most common plasma-based surface modification techniques for biomedical applications, described in more detail later plasma assisted chemical vapor deposition or PACVD (RF, MW), physical vapor deposition or PVD (sputtering, cathodic arc), plasma polymerization and grafting, plasma-based thermochemical treatments (e.g. plasma nitriding), ion implantation, plasma immersion ion implantation or PHI, and plasma spraying. Each technique has unique advantages and applications, and the choice of the more adequate technique often depends on the... 

Wierzchofi, T. Sobiecki, J.R. Krupa, D. (1993). The Formation of Ti(OCN) Layers Produced from Metal-Organic Compwtmds Using Plasma-Assisted Chemical Vapour Deposition. Surf. Coat Technol., Vol. 59, pp. 217-220 Xinyao, Y. Zhongqing, J. Yuedong, M (2010). Effects of Sputtering Parameters on the Performance of Sputtered Cathodes for Direct Methanol Fuel Cells. Plasma Sci. Technol, Vol. 12, pp. 87-91... 

A tubular hollow sputtering cathode with a gas flow through it is used in the gas flow sputtering source (Figure... 

Sputtering, triode A sputtering arrangement that has three electrodes. One cathode is the cathode of the gas discharge another electrode is the anode of the gas discharge (and is often a hot filament electron emitter). The third electrode is a sputtering cathode that provides the sputtered species to be deposited. 

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