Thin film sputtering

Thermal spray, laser deposition, physical vapor deposition, and magnetron sputtering are physical processes that are used for fabrication of electrolyte thin films. Sputtering is a reliable technique for film deposition and is being used in industry... 

Usually the nanotube arrays have been made from a titanium thick film or foil, in which case the resulting nanotubes rest upon an underlying Ti substrate as separated by a barrier layer. The nanotube arrays have also been fabricated from a titanium thin film sputtered onto a variety of substrates, such as silicon and fluorine doped tin oxide (FTO) coated conductive glass. This extends the possibility for preparing technical catalysts by deposing a thin Ti layer over a substrate (a foam, for example) and then inducing the formation of the nanostructured titania film by anodic oxidation. ... 

J. Pompei, Proc. 2nd Symp. Deposition Thin Films Sputter., Univ. Rochester, 1967, p. 127. 

In addition to studying the performance of thin-film sputtered R electrodes, the effect of Teflon (PTFE) incorporation in the carbon Toray paper... 

Premchand, Y. D., Djenizian, T, Vacandio, F, and Knauth, P. (2006). Fabrication of self-organized Ti02 nanotubes from columnar titanium thin films sputtered on semiconductor surfaces. Eiectrochem. Commun. 8, pp. 1840-1844. 

Fig. 18. Ideal and real sputter-depth profiles for thin film of A and substrate B.

The requirements of thin-film ferroelectrics are stoichiometry, phase formation, crystallization, and microstmctural development for the various device appHcations. As of this writing multimagnetron sputtering (MMS) (56), multiion beam-reactive sputter (MIBERS) deposition (57), uv-excimer laser ablation (58), and electron cyclotron resonance (ECR) plasma-assisted growth (59) are the latest ferroelectric thin-film growth processes to satisfy the requirements. 

Low pressure argon is the usual medium for industrial sputtering of metals and other soHd films (100) (see Thin films, film formation techniques). 

Thin-film media can be made by various technologies, eg, sputtered deposited Co—Cr—X films for longitudinal appHcations, laminated media for hard disk apphcation, metal evaporated tape, and multilayers for possible appHcations in magnetooptic recording. 

Alternative Thin-Film Fabrication Approaches. Thin films of electronic ceramic materials have also been prepared by sputtering, electron beam evaporation, laser ablation, chemical beam deposition, and chemical vapor deposition (CVD). In the sputtering process, targets may be metal... 

There are several methods for the fabrieation of thin-film earbon eleetrode ineluding sputtering [4, 5], eleetron beam evaporation [6], pyrolysis of polymerie thin film [7] and pyrolysis of gaseous hydroearbons [8]. 

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