Reactive radio frequency sputtering

Azuma et al. have studied the electrochemical properties of transition metal nitrides prepared by a reactive radio-frequency sputtering method such as ZrN [22], NbN [23], CoN [24], TiN, and VN [23]. Electrochemical reduction of oxygen was... 

H. Nakazawa, A. Sudoh, M. Suemitsu, K. Yasui, T. ltoh,T. Endoh, Y. Narita, M. Mashita, Mechanical and tribological properties of boron, nitrogen-coincorporated diamond-like carbon films prepared by reactive radio-frequency magnetron sputtering., Diamond and Related Materials, vol. 19, pp. 503-506, 2010. 

Ishizuka, S. O., Kato, S., Maruyama, T. and Akimoto, K. (2001). Nitrogen doping into Cu20 thin films deposited by reactive radio-frequency magnetron sputtering. Jpn. J. Appl. Phys. Part 1-Regular Papers Short Notes Review Papers 40(4B), 2765-2768. 

Ohnishi R, Katayama M, Takanahe K, Kubota J, Domen K (2010) Niobium-based catalysts prepared by reactive radio-frequency magnetron sputtering and arc plasma methods as nonnoble metal cathode catalysts for polymer electrolyte fuel cells. Electrochim Acta 55 5393-5400... 

MS, magnetron sputtering RMS, reactive magnetron sputtering RF, MF, radio frequency or mid frequency plasma excitation p-DC, pulsed-DC excitation Substrate arranged perpendicular relative to the target (reduced ion bombardment of the film)... 

Kitano, M., Funatsu, K., Matsuoka, M., Ueshima, M. and Anpo, M. (2006). Preparation of nitrogen-substituted Ti02 thin film photocatalysts by the radio frequency magnetron sputtering deposition method and their photocatalytic reactivity under visible light irradiation. J. Phys. Chem. B 110(50), 25266-25272. 

Meng L.-J. and Dos Santos M. P., Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering,/. Vac. Sci. Technol. A18(4)(2000)pp. 1668-1671. 

Liu, Y, Ishihara, A., Mitsushima, S. Ota, K.i. Influence of sputtering power on oxygen reduction reaction activity of zirconium oxides prepared by radio frequency reactive sputtering. Electrochim. Acta 55 (2010), pp. 1239-1244. 

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