Sputter Deposition of cBN Films

In this section cBN film preparation by sputter deposition will be discussed in detail. Such techniques have a high potential for later scaling up of deposition devices and for practical utilization, such as in the field of tool coatings. 

5 Vapor Phase Deposition of Cubic Boron Nitride Films 

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The process data for the sputter deposition of cBN films by RF (13.56 MHz) diode sputtering with hBN and B4C targets as well as by d.c. magnetron sputtering with B4C targets have been reported in detail elsewhere [21,24,54]. In both configurations the ionization was enhanced by additional magnetic coils positioned around the substrate holder. The substrate electrodes were operated either with a d.c. potential, with pulsed d.c. [57] or with RF power. 

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