Deposition methods sputtering

In additional studies Cr was thermally evaporated onto FPAE surfaces and examined in an identical fashion. Similar results were obtained indicating that differences in the deposition method (sputtering vs. evaporation) have little affect on the formation interfacial products. 

Hauch and Georg used sandwich cells as illustrated in Figure 3.50 to compare Rcr for Pt counter electrodes prepared using different deposition methods (sputtering, evaporation and thermal) on conducting glass with a sheet resistance of 10 sq . For champion cells, the counter electrode... 

Metallization layers are generally deposited either by CVD or by physical vapor deposition methods such as evaporation (qv) or sputtering. In recent years sputter deposition has become the predominant technique for aluminum metallization. Energetic ions are used to bombard a target such as soHd aluminum to release atoms that subsequentiy condense on the desired substrate surface. The quaUty of the deposited layers depends on the cleanliness and efficiency of the vacuum systems used in the process. The mass deposited per unit area can be calculated using the cosine law of deposition ... 

Anode materials are most typically deposited by evaporation, sputtering, or chemical vapor deposition methods. Other methods such as screen printing, laser ablation, electrochemical deposition, etc., have also been used. 

Although the sputter deposition technique can provide a cheap and directly controlled deposition method, the performance of PEM fuel cells with sputtered CLs is still inferior to that of conventional ink-based fuel cells. In addition, other issues arise related to the physical properties of sputtered catalyst layers, such as low lateral electrical conductivity of the thin metallic films [96,108]. Furthermore, the smaller particle size of sputter-deposited Ft can hinder water transport because of the high resistance to water transport in a thick, dense, sputtered Ft layer [108]. Currently, the sputter deposition method is not considered an economically viable alternative for large-scale electrode fabrication [82] and further research is underway to improve methods. 

Levels of lactate in buttermilk and yoghurt (and blood) were estimated using disposable sensors formed from screen-printed graphite laminated between two polymer sheets [18]. Platinum (deposited by sputter-coating) was the transducing surface. Layers of Nation were added to reduce interference and were surmounted by lactate oxidase in a mixture of polyethyleneimine and poly (carbamoyl) sulphonate hydrogel. The samples were measured in stirred buffer. A good correlation between biosensor results and those obtained with an enzyme kit was claimed but the data had a considerable amount of scatter—if the enzyme kit is taken as the reference method then a more severe analysis of the biosensor results [33] would not have shown them in a... 

Thin semiconductor films (and other nanostructured materials) are widely used in many applications and, especially, in microelectronics. Current technological trends toward ultimate miniaturization of microelectronic devices require films as thin as less than 5 nm, that is, containing only several atomic layers [1]. Experimental deposition methods have been described in detail in recent reviews [2-7]. Common thin-film deposition techniques are subdivided into two main categories physical deposition and chemical deposition. Physical deposition techniques, such as evaporation, molecular beam epitaxy, or sputtering, involve no chemical surface reactions. In chemical deposition techniques, such as chemical vapor deposition (CVD) and its most important version, atomic layer deposition (ALD), chemical precursors are used to obtain chemical substances or their components deposited on the surface. 

Possibility to prepare the TCO layers on large areas (>lm2) by deposition methods like magnetron sputtering or metal-organic chemical vapor deposition (MOCVD)... 

In the following we will focus on the first three deposition methods, since these deliver the best films with respect to low resistivity and high transparency. Especially, magnetron sputtering is a technique, which is already... 

The most common method for large-scale physical vapor deposition is sputtering. Sputtering is fundamentally different from the three heating methods... 

Renewed interest in the optical properties of silicon films prepared by various new methods, like chemical vapor deposition (CVD), glow-discharge deposition, and sputter deposition, also stimulated investigations of the characteristics of these films for optical recording. 

Kikuchi, H., Kitano, M., Takeuchi, M., Matsuoka, M., Anpo, M. and Kamat, P. V. (2006). Extending the photoresponse of Ti02 to the visible light region Photoelectrochemical behavior of Ti02 thin films prepared by the radio frequency magnetron sputtering deposition method. J. Phys. Chem. B 110(11), 5537-5541. 

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