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Sputtered neutral

Sputtered Neutral Mass Spectrometry (SNMS) is the mass spectrometric analysis of sputtered atoms ejected from a solid surface by energetic ion bombardment. The sputtered atoms are ionized for mass spectrometric analysis by a mechanism separate from the sputtering atomization. As such, SNMS is complementary to Secondary Ion Mass Spectrometry (SIMS), which is the mass spectrometric analysis of sputtered ions, as distinct from sputtered atoms. The forte of SNMS analysis, compared to SIMS, is the accurate measurement of concentration depth profiles through chemically complex thin-film structures, including interfaces, with excellent depth resolution and to trace concentration levels. Genetically both SALI and GDMS are specific examples of SNMS. In this article we concentrate on post ionization only by electron impact. [Pg.43]

In other articles in this section, a method of analysis is described called Secondary Ion Mass Spectrometry (SIMS), in which material is sputtered from a surface using an ion beam and the minor components that are ejected as positive or negative ions are analyzed by a mass spectrometer. Over the past few years, methods that post-ion-ize the major neutral components ejected from surfaces under ion-beam or laser bombardment have been introduced because of the improved quantitative aspects obtainable by analyzing the major ejected channel. These techniques include SALI, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS), and Sputtered Neutral Mass Spectrometry (SNMS) or electron-gas post-ionization. Post-ionization techniques for surface analysis have received widespread interest because of their increased sensitivity, compared to more traditional surface analysis techniques, such as X-Ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES), and their more reliable quantitation, compared to SIMS. [Pg.559]

By examining the sputtered neutral particles (the majority channel) using nons-elective photoionization and TOFMS, SALI generates a relatively uniform sensitivity with semiquantitative raw data and overcomes many of the problems associated with SIMS. Estimates for sensitivities vary depending on the lateral spatial resolution for a commercial liquid-metal (Ga ) ion gun. Galculated values for SALI... [Pg.567]

A discussion of the motivation behind doing sputtered neutral analysis versus SIMS, plus a description of the first prototype SALI instrument. A well written introduction for someone without previous surface analysis experience it also includes an historical overview of the various post-ionization techniques. [Pg.569]

The atom flux sputtered from a solid surface under energetic ion bombardment provides a representative sampling of the solid. Sputtered neutral mass spectrometry has been developed as method to quantitatively measure the composition of this atom flux and thus the composition of the sputtered material. The measurement of ionized sputtered neutrals has been a significant improvement over the use of sputtered ions as a measure of flux composition (the process called SIMS), since sputtered ion yields are seriously affected by matrix composition. Neutral panicles are ionized by a separate process after sputter atomization, and SNMS quantitation is thus independent of the matrix. Also, since the sputtering and ionization processes are separate, an ionization process can be selected that provides relatively uniform yields for essentially all elements. [Pg.571]

The various SNMS instruments using electron impact postionization differ both in the way that the sample surface is sputtered for analysis and in the way the ionizing electrons are generated (Figure 2). In all instruments, an ionizer of the electron-gun or electron-gas types is inserted between the sample surface and the mass spectrometer. In the case of an electron-gun ionizer, the sputtered neutrals are bombarded by electrons from a heated filament that have been accelerated to 80—... [Pg.573]

Figure 2 Relationship of SIMS, separate bombardment SNMSs and direct bombardment SNMSd. (a) Materials for SIMS analysis are those ions formed In the sputtering with a focused primary ion beam. The largest fraction of the particles sputtered from the surface are neutral atoms, (b) Ions for SNMS analysis are formed by ionization of the sputtered neutrals, (c) When the plasma is used as an ionizer, plasma ions can also be used to sputter the sample surface at low energies. Figure 2 Relationship of SIMS, separate bombardment SNMSs and direct bombardment SNMSd. (a) Materials for SIMS analysis are those ions formed In the sputtering with a focused primary ion beam. The largest fraction of the particles sputtered from the surface are neutral atoms, (b) Ions for SNMS analysis are formed by ionization of the sputtered neutrals, (c) When the plasma is used as an ionizer, plasma ions can also be used to sputter the sample surface at low energies.
Similar detailed studies of RSFs have been carried out for GDMS, but not for electron-gun electron impact ionization or for SALI. The spread in elemental RSFs for electron-gas SNMS is comparable to that observed for Ar glow-discharge ionization of sputtered neutrals. ... [Pg.576]

Sputtered Neutrals Mass Spectrometry Secondary Neutrals Mass Spectrometry Direct Bombardment Electron Gas SNMS... [Pg.768]

Sputtered Neutral Mass Spectrometry, Glow-Discharge Mass Spectrometry... [Pg.771]

The ratio Db/Da is a so-called relative sensitivity factor D. This ratio is mostly determined by one element, e. g. the element for insulating samples, silicon, which is one of the main components of glasses. By use of the equation that the sum of the concentrations of all elements is equal to unity, the bulk concentrations can be determined directly from the measured intensities and the known D-factors, if all components of the sample are known. The linearity of the detected intensity and the flux of the sputtered neutrals in IBSCA and SNMS has been demonstrated for silicate glasses [4.253]. For SNMS the lower matrix dependence has been shown for a variety of samples [4.263]. Comparison of normalized SNMS and IBSCA signals for Na and Pb as prominent components of optical glasses shows that a fairly good linear dependence exists (Fig. 4.49). [Pg.246]

In SNMS, sputtered neutrals are post-ionized before they enter the mass spectrometer. In contrast to SIMS, SNMS does not suffer from the matrix effects associated with the ionization probability of sputtered particles. Here, the sensitivity for a cer-... [Pg.111]

H. Oechsner and W. Gerhard. A Method for Surface Analysis by Sputtered Neutrals. Phys. Lett., 40(1972) 211-212. [Pg.77]

Spurted fibers, 11 240—241 Sputter deposition, 23 7, 24 728-736 advantages and disadvantages of, 24 736 Sputter depth profiling, 24 98-100 Sputtered gold coatings, 12 693 Sputtered neutral mass spectrometry (SNMS), 24 108... [Pg.878]

Another important characteristic is that ion beams can produce a variety of the secondary particles/photons such as secondary ions/atoms, electrons, positrons. X-rays, gamma rays, and so on, which enable us to use ion beams as analytical probes. Ion beam analyses are characterized by the respectively detected secondary species, such as secondary ion mass spectrometry (SIMS), sputtered neutral mass spectrometry (SNMS), electron spectroscopy, particle-induced X-ray emission (PIXE), nuclear reaction analyses (NRA), positron emission tomography (PET), and so on. [Pg.814]

Glow discharge source (GDMS) Laser ion source (LIMS) Secondary ion source (SIMS) Sputtered neutral source (SNMS) Thermal ionization source (TIMS) Inductively coupled plasma ion source (ICP-MS)... [Pg.4]

The ion source is an essential component of all mass spectrometers where the ionization of a gaseous, liquid or solid sample takes place. In inorganic mass spectrometry, several ion sources, based on different evaporation and ionization processes, such as spark ion source, glow discharge ion source, laser ion source (non-resonant and resonant), secondary ion source, sputtered neutral ion source and inductively coupled plasma ion source, have been employed for a multitude of quite different application fields (see Chapter 9). [Pg.25]

Ion Sources for Secondary Ion Mass Spectrometry (SIMS) and Sputtered Neutral Mass Spectrometry (SNMS)... [Pg.60]

Secondary ion mass spectrometry (SIMS) and sputtered neutral mass spectrometry (SNMS) are today the most important mass spectrometric techniques for surface analysis, especially for thin layer analysis, for depth profiling, for the determination of contaminations and element distribution on a solid sample surface. [Pg.60]

In SIMSLAB from VG Scientific, both surface analytical techniques - SIMS and SNMS - have been applied (see Figure 5.34). In this mass spectrometer different types of primary ion sources are available. Ar+, Cs+, Ga+ or O) primary ions are accelerated in the secondary ion source on the solid sample surface. Similar to the CAMECA IMS-7f, with this experimental arrangement, besides depth profiling, a microlocal analysis can also be performed. The sputtered secondary ions (for SIMS) or the post-ionized sputtered neutrals (for SNMS) - the post-ionization is carried out by an electron beam in an ionizer box (right-hand schematic in Figure 5.34) - are separated... [Pg.165]

Figure 5.34 Combination of a secondary ion and sputtered neutral mass spectrometer with a quadrupole analyzer (SIMSLAB, Fisons). (. S. Becker and H. /. Dietze, Int.. Mass Spectrom. Ion Proc. 197, 1-35 (2000). Reproduced by permission of Elsevier.)... Figure 5.34 Combination of a secondary ion and sputtered neutral mass spectrometer with a quadrupole analyzer (SIMSLAB, Fisons). (. S. Becker and H. /. Dietze, Int.. Mass Spectrom. Ion Proc. 197, 1-35 (2000). Reproduced by permission of Elsevier.)...
Quantitative depth profiling using polyatomic MCs+ and MCs2+ ions instead of atomic ions M= ions is well established in surface analysis using SIMS. The MCs+ technique, which reduces matrix effects significantly, was proposed by Gao in 1988.100 The formation of MCs+ has been explained by the recombination of sputtered neutral atoms (M) with... [Pg.278]

SNMS ions neutrals ZZ sputtered neutrals (post ionized by e-beam or laser) > 3 nm 5 pm (+) > P gg-1 high depth resolution elemental information poor sensitivity... [Pg.288]


See other pages where Sputtered neutral is mentioned: [Pg.2802]    [Pg.265]    [Pg.43]    [Pg.527]    [Pg.529]    [Pg.529]    [Pg.561]    [Pg.571]    [Pg.580]    [Pg.122]    [Pg.392]    [Pg.617]    [Pg.27]    [Pg.258]    [Pg.299]    [Pg.305]    [Pg.5]    [Pg.27]    [Pg.27]    [Pg.61]    [Pg.164]    [Pg.165]    [Pg.412]   


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