Radio Frequency RF Sputtering

Other interesting thin-film studies using AES have included the growth of platinum on Ti02- and SrO-terminated (100) SrTiOs single-crystal substrates [2.154], of epitaxial niobium films on (110) T1O2 [2.155], the interaction of copper with a (0001) rhenium surface [2.156], and the characterization of radio-frequency (rf) sputtered TiN films on stainless steel [2.157]. 

Radio-Frequency (RF) sputtering, using frequencies above 50 kHz, can sputter insulators but the process has low deposition rates. 

The photovoltaic devices were then completed with a 50-nm layer of chemically deposited CdS, 50 nm of radio frequency (RF) sputtered intrinsic ZnO, and 350 nm of Al-doped ZnO and bilayer Ni/Al top contacts deposited by e-beam. Finally, a 100-nm layer of MgF2 is deposited by e-beam to minimize... 

Deposition of insulating layers is solved by radio frequency (rf) sputtering. In industrial applications, however, cooling problems and inacceptable low deposition rates restrict the use of radiofrequency sputtering. Other methods have been developed to overcome these limitations. 

Sputtering for Rim Deposition, Rgure 3 The principle of a radio frequency (RF) sputtering system... 

It is usually difficult to investigate lithium intercalation and deintercalation behavior with composite cathodes because of the nonuniform potential distributions and unknown electrode surface area [104]. To avoid this problem, researchers replaced composite electrodes with thin-film electrodes, making vacuum techniques a tool of choice in small-scale bench top research. Many techniques have been developed for fabrication of thin-film electrodes, including chemical vapor deposition (CVD) [108-111], electrostatic spray deposition (ESD) [112-117], pulsed laser deposition (PLD) [2, 118-121], and radio frequency (RF) sputtering. Vacuum systems are typically required in each of these techniques. Each technique for fabricating LiCo02 cathodes will be addressed below. 

---