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Radio frequency RF magnetron sputtering

Boyd, A.R., Meenan, B.J., and Leyland, N.S. (2006) Surface characterisation of the evolving nature of radio frequency (RF) magnetron sputter deposited calcium phosphate films after exposure to physiological solution. Surf. Coat. Technol., 200 (20/21), 6002 -6013. [Pg.230]

The main deposition methods of NS-Ti02 onto stainless steels are cathodic arc deposition [532], electrophoretic deposition [533], anodic spark deposition (ASD) [534], the sol-gel method [535, 536], atmospheric pressure metal organic CVD (AP-MOCVD) [537, 538] and radio frequency (RF) magnetron sputtering [539]. Preparation methods and applications of NS-Ti02 thin films on stainless steel have been summarized in Table 15. [Pg.114]

Metallic chromium Radio frequency (RF) magnetron sputtering Development a colored mirror with hydrophilicity [561]... [Pg.120]

The samples used for investigation were prepared by co-deposition of Ge and S i02 by radio-frequency (rf) magnetron sputtering onto quartz substrate with about 3-5-nm-thick native oxide. The sample thickness is 1 iim and Ge concentration is 60 mol%. After deposition, the sample was annealed for 1 h at 800°C in an argon atmosphere which produced the NCs. More details on the sample preparation are given in Ref. [14]. Figure 12.10 shows the transmission electron microscopic (TEM) image of the annealed Ge NCs [45]. One can see clearly that the size of the Ge NCs is 5 nm and they form a kind of continnons network. [Pg.286]

Radio frequency (RF) magnetron sputtering deposition technique... [Pg.118]

MS, magnetron sputtering RMS, reactive magnetron sputtering RF, MF, radio frequency or mid frequency plasma excitation p-DC, pulsed-DC excitation Substrate arranged perpendicular relative to the target (reduced ion bombardment of the film)... [Pg.66]

A number of variations have been introduced to improve the efficiency of the deposition process. Instead of a dc potential, a radio-frequency voltage can be used to maintain the plasma ( rf-sputtering ). Deposition rates may be increased by adding a focusing system or magnetron. Another improvement makes use of a separate anode to produce the plasma and to preserve the quality of the target. This system is known as a triode. [Pg.81]


See other pages where Radio frequency RF magnetron sputtering is mentioned: [Pg.485]    [Pg.618]    [Pg.495]    [Pg.396]    [Pg.332]    [Pg.40]    [Pg.121]    [Pg.523]    [Pg.608]    [Pg.28]    [Pg.106]    [Pg.336]    [Pg.77]    [Pg.115]    [Pg.485]    [Pg.618]    [Pg.495]    [Pg.396]    [Pg.332]    [Pg.40]    [Pg.121]    [Pg.523]    [Pg.608]    [Pg.28]    [Pg.106]    [Pg.336]    [Pg.77]    [Pg.115]    [Pg.232]    [Pg.6102]    [Pg.58]    [Pg.19]    [Pg.92]    [Pg.194]    [Pg.430]    [Pg.210]    [Pg.940]    [Pg.671]    [Pg.37]    [Pg.10]    [Pg.154]    [Pg.322]    [Pg.248]    [Pg.328]    [Pg.321]   


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Magnetron

Magnetron frequency

RF-sputtering

Radio frequency RF sputtering

Radio frequency magnetron sputtering

Radio frequency sputtering

Radio, radios

Radio-frequency

Radio-frequency magnetron

Sputtered

Sputtering

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