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Electron beams

Unlike X-rays and gamma rays, electrons are rapidly attenuated. The maximum range of a 1-million-volt electron is about 4 m in air and about 5 cm in water. In [Pg.455]

FIGURE 28. Structural model of the evaporated film. (Reprinted from Ref. 30.) [Pg.246]

The first step (Fig. 29a) is the evaporation of the polysilane material and recrystallization on the substrate. The film is then irradiated by the electron beam (Fig. 29b). In the irradiated area of the film, C-O-C, Si-O-C, and Si-O-Si bonds are formed between nearest-neighbor polysilane chains. Thus the [Pg.246]

FIGURE 29. Process for the fabrication of the submicron pattern. (Reprinted from Ref. 130.) [Pg.247]


Application of ceramics allows using stainless steel as vacuum envelope. No surface charges ean deflect the electron beam. Mechanical elements and functions can be easily integrated into the envelope due to its stability. [Pg.534]

XES, Soft x-ray emission An x-ray or electron beam Energy levels and chemical... [Pg.314]

ESD Electron-stimulated (impact) desorption [148, 149] An electron beam (100-200) eV) ejects ions from a surface Surface sites and adsorbed species... [Pg.315]

Figure Al.7.12 shows the scattered electron kinetic energy distribution produced when a monoenergetic electron beam is incident on an A1 surface. Some of the electrons are elastically backscattered with essentially... Figure Al.7.12 shows the scattered electron kinetic energy distribution produced when a monoenergetic electron beam is incident on an A1 surface. Some of the electrons are elastically backscattered with essentially...
Figure Al.7.12. Secondary electron kinetic energy distribution, obtained by measuring the scadered electrons produced by bombardment of Al(lOO) with a 170 eV electron beam. The spectrum shows the elastic peak, loss features due to the excitation of plasmons, a signal due to the emission of Al LMM Auger electrons and the inelastic tail. The exact position of the cutoff at 0 eV depends on die surface work fimction. Figure Al.7.12. Secondary electron kinetic energy distribution, obtained by measuring the scadered electrons produced by bombardment of Al(lOO) with a 170 eV electron beam. The spectrum shows the elastic peak, loss features due to the excitation of plasmons, a signal due to the emission of Al LMM Auger electrons and the inelastic tail. The exact position of the cutoff at 0 eV depends on die surface work fimction.
A popular electron-based teclmique is Auger electron spectroscopy (AES), which is described in section Bl.25.2.2. In AES, a 3-5 keV electron beam is used to knock out iimer-shell, or core, electrons from atoms in the near-surface region of the material. Core holes are unstable, and are soon filled by either fluorescence or Auger decay. In the Auger... [Pg.307]

Figure Al.7.13. ESDIAD patterns showing the angular distributions of F emitted from PF adsorbed on Ru (0001) under electron bombardment, (a) 0.25 ML coverage, (b) the same surface following electron beam damage. Figure Al.7.13. ESDIAD patterns showing the angular distributions of F emitted from PF adsorbed on Ru (0001) under electron bombardment, (a) 0.25 ML coverage, (b) the same surface following electron beam damage.
Marrian C R K, Perkins F K, Brandow S L, Koloski T S, Dobisz E A and Calvert J M 1994 Low voltage electron beam lithography in self-assembled ultrathin films with the scanning tunneling microscope Appi. Rhys. Lett. 64 390... [Pg.319]

Madey T E ef a/1993 Structure and kinetics of electron beam damage in a chemisorbed monolayer PFjOn Ru(OOOI) Desorption Induced by Electronic Transitions DIET V vol 31, ed A R Burns, E B Stechel and D R Jennison (Berlin Springer)... [Pg.320]

The above Cl reactions will occur if they are exothennic. In order for these reactions to occur with high efficiency, the pressure in the ion source must be raised to the milliTorr level. Also, the reagent species are often introduced in large excess so that they are preferentially ionized by the electron beam. [Pg.1331]

Szule]ko J E and McMahon T B 1991 A pulsed electron beam, variable temperature, high pressure mass... [Pg.1359]

The history of EM (for an overview see table Bl.17,1) can be interpreted as the development of two concepts the electron beam either illuminates a large area of tire sample ( flood-beam illumination , as in the typical transmission electron microscope (TEM) imaging using a spread-out beam) or just one point, i.e. focused to the smallest spot possible, which is then scaimed across the sample (scaiming transmission electron microscopy (STEM) or scaiming electron microscopy (SEM)). In both situations the electron beam is considered as a matter wave interacting with the sample and microscopy simply studies the interaction of the scattered electrons. [Pg.1624]

Busch focuses an electron beam with a magnetic lens 1931 Ruska and colleagues build the first TEM protoype... [Pg.1624]

Cambridge Instruments builds the first commercial SEM 1968 Crewe and colleagues introduce the PEG as electron beam source 1968 Crewe and colleagues build the first STEM prototype 1995 Zach proves the concept of a corrected LVSEM... [Pg.1624]

Modem EMs use electromagnetic lenses, shift devices and spectrometers. However, electrostatic devices have always been used as electron beam accelerators and are increasingly being used for other tasks, e.g. as the objective lens (LVSEM, [10]). [Pg.1630]

EM instmments can be distinguished by the way the infonnation, i.e. the interacting electrons, is detected. Figure Bl.17.2 shows the typical situations for TEM, STEM, and SEM. For TEM the transmitted electron beam of the brightfield illumination is imaged simply as in an light microscope, using the objective and... [Pg.1630]

Figure Bl.17.2. Typical electron beam path diagrams for TEM (a), STEM (b) and SEM (c). These schematic diagrams illustrate the way the different signals can be detected m the different instmments. Figure Bl.17.2. Typical electron beam path diagrams for TEM (a), STEM (b) and SEM (c). These schematic diagrams illustrate the way the different signals can be detected m the different instmments.
Except for the phase-contrast detector in STEM [9], STEM and SEM detectors do not track the position of the recorded electron. The spatial information of an image is fonned instead by assigning the measured electron current to the known position of the scaimed incident electron beam. This infomiation is then mapped into a 2D pixel array, which is depicted either on a TV screen or digitalized in a computer. [Pg.1633]

Specimens for (S)TEM have to be transparent to the electron beam. In order to get good contrast and resolution, they have to be thin enough to minimize inelastic scattering. The required thin sections of organic materials can be obtained by ultramicrotomy eitlier after embedding into suitable resms (mostly epoxy- or methacrylate resins [H]) or directly at low temperatures by cryo-ultramicrotomy [12]. [Pg.1633]

The infonuation that can be extracted from inorganic samples depends mainly on tlie electron beam/specimen interaction and instrumental parameters [1], in contrast to organic and biological materials, where it depends strongly on specimen preparation. [Pg.1634]


See other pages where Electron beams is mentioned: [Pg.534]    [Pg.569]    [Pg.294]    [Pg.310]    [Pg.307]    [Pg.307]    [Pg.313]    [Pg.1243]    [Pg.1309]    [Pg.1311]    [Pg.1312]    [Pg.1312]    [Pg.1330]    [Pg.1330]    [Pg.1332]    [Pg.1380]    [Pg.1559]    [Pg.1623]    [Pg.1629]    [Pg.1630]    [Pg.1630]    [Pg.1630]    [Pg.1632]    [Pg.1633]    [Pg.1633]    [Pg.1636]    [Pg.1636]    [Pg.1640]    [Pg.1641]    [Pg.1642]    [Pg.1645]   
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Accelerator electron beam

Analytical techniques electron beam

Application to an Electron Beam

Applications of Electron Beam Radiation

Beam detectors electron bombardment

CBED (convergent beam electron

Charging electron beam

Coating electron beam curing

Coating electron beam physical vapor deposition

Coatings, electron beam cure

Colloidal nanoparticles electron beam lithography

Composites electron beam damage

Conductive electron-beam resists

Convergent (or focused) beam electron diffraction

Convergent beam electron

Convergent beam electron diffraction

Convergent beam electron diffraction CBED)

Convergent-beam electron diffraction LACBED

Convergent-beam electron diffraction factors

Crosslinking electron beam

Crosslinking electron beam irradiation

Crosslinking electron beam-initiated irradiation

Crystallinity electron beam irradiation

Device fabrication, electron beam lithography

Direct-write electron-beam systems

Dynamitron electron beam accelerators

ELECTRON BEAM COATING

ELECTRON BEAM PROCESSING OF POLYMERS

ELECTRON BEAM Subject

Effects of electron-beam curing

Electron Beam Applications to Flue Gas Treatment

Electron Beam Energy

Electron Beam Induced Current

Electron Beam Ion Trap EBIT)

Electron Beam Machining (EBM)

Electron Beam Process in Tire Technology

Electron Beam Process in Wire and Cable Technology

Electron Beam Process in the Manufacture of Polyolefin Foams

Electron Beam Process in the Production of Heat-Shrinkable Materials

Electron Beam Processing of Elastomers

Electron Beam Processing of Liquid Systems

Electron Beam Rotating Disk Atomization

Electron Beam Welding (EBW)

Electron beam absorption

Electron beam activation

Electron beam alignment

Electron beam as a local heat source

Electron beam bleaching

Electron beam characterized

Electron beam coating costs

Electron beam crosslink

Electron beam curable

Electron beam curable acrylate adhesives

Electron beam curable adhesives

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Electron beam cure

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Electron beam curing Cross-linking

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Electron beam curing radical reactions

Electron beam current

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Electron beam deposition

Electron beam diluents

Electron beam dosimetry

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Electron beam dry scrubbing (EBDS

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Electron beam evaporation

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Electron beam lithography tunnelling

Electron beam lithography waves

Electron beam machining

Electron beam measurements

Electron beam method

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Electron beam patterning

Electron beam physical vapor deposition

Electron beam physical vapor deposition EB-PVD)

Electron beam physical vapour deposition

Electron beam power

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Electron beam process

Electron beam processing

Electron beam projection lithography

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Electron beam radiation, applications

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Electron beam resist reactions

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Electron beam resist, molecular weight

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Electron beam resists chain

Electron beam resists ethyl acrylate

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Electron beam rotating disk

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Electron beam technology

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Electron beams, diffraction

Electron beams, from linear accelerator

Electron emission photon beams

Electron microscopy beam damage

Electron microscopy, molecular beam

Electron molecular beam studies

Electron transfer cross-beam experiment

Electron- and Ion Beam-Assisted Deposition (EBAD, IBAD)

Electron-beam CT

Electron-beam analysis

Electron-beam back-scattered diffraction

Electron-beam computed tomography

Electron-beam curing

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Electron-beam curing of polymeric materials

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Electron-beam curing principle

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Electron-beam lithography direct write

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Electron-beam lithography electronic properties, effect

Electron-beam lithography limitations

Electron-beam lithography organic resist materials

Electron-beam lithography resists

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Electron-beam lithography, alternative

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Electron-beam radiation copolymers

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Electron-beam resist methacrylate)

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Electron-beam resist novolac-based

Electron-beam resist plasma developable

Electron-beam resist poly

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Electron-beam system, compound

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Energetic electron beams

Energy of electron beam

Epoxy groups, electron-beam exposure

Ethylene vinyl acetate electron beam irradiation

Exposure system, electron beam

FDA compliance for Ultraviolet Electron Beam (EB) Coatings and Adhesives

Filaments, electron beams from

General Effects of Electron Beam on Polymers

Gold nanoparticles electron beam lithography

High-energy electron beam

Hybridized resistive/electron beam

I electron beam

Imaging by scanning electron beam

Incident electron beam, surface analysis

Indirect electron beam exposure

Indirect electron beam induced ferroelectric domain breakdown

Influence of electron beam intensity

Initiation by electron beams

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Initiation of Polymerization with Radioactive Sources and Electron Beams

Intense relativistic electron beam

Ionization electron beams

Large angle convergent beam electron diffraction

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Lithography electron beam

Lithography nanolithography electron-beam

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Mass spectrometry pulse electron-beam

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Metallic nanoparticles electron beam lithography

Methyl methacrylate copolymers, electron-beam

Methyl methacrylate copolymers, electron-beam exposure

Methyl methacrylate, electron-beam

Methyl methacrylate, electron-beam sensitivities

Modulation electron beam

Molecular beam comparison with electron

Molecular beam epitaxy reflection high energy electron

Molecular beam magnetic resonance of electronically excited molecules

Nano-beam electron diffraction

Negative electron beam resist methacrylate)

Negative electron beam resist poly

Negative electron beam resists

Negative electron beam resists resolution

Negative electron-beam resists characteristics

Nitrides electron beam evaporation

Palladium electron beam) evaporation

Parallel electron beam lithography

Phenolic resin based negative electron beam

Phenolic resin based negative electron beam resist

Photo electron-beam lithography

Photoresist polymers electron beam

Physical electron beam treatment

Polarization of an electron beam

Poly electron beam lithography

Poly electron-beam exposed

Poly electron-beam exposure

Poly electron-beam irradiation effects

Polymer electron beam

Polymer electron beam sensitive

Polymer electron-beam vinyl resist

Polymerization electron beam process

Polymerization with Radioactive Sources and Electron Beams

Polymers by Electron Beam

Polymers with Electron Beams

Polyolefin foams electron beam process

Positive electron beam resists, molecular

Positive electron-beam resist poly

Positive electron-beam resists

Positive working electron-beam resists

Primary electron beam

Principles of Electron-beam and HF-Plasma SNMS

Pulsed electron beam

Pulsed electron beam deposition

Pulsed electron beam polymerization

Quantum dots electron beam lithography

Rastered electron beam

Reduction electron beam

Reflection high energy electron diffraction, molecular beam epitaxy

Resist electron-beam vinyl

Scanning beam-specimen backscattered electrons

Scanning beam-specimen secondary electrons

Scanning electron beam systems

Scanning electron beams

Scanning electron microscopy beam-specimen Interactions

Scanning electron-beam lithography

Self-developing electron-beam resists

Shaped electron beam columns

Shock Initiation of Lead Azide with an Electron Beam

Silicon electron-beam-induced reduction

Silicon-containing electron-beam resist

Silicon-containing electron-beam resist systems

Static reactor electron beam

Supersonic jets molecular beam electronic spectroscopy

Surface modification electron beam

Tensile Strength Data from Electron Beam Cross-Linked Polybutadiene and Its Copolymers

Tensile Strength Data from Electron Beam Cured Natural Rubber

Thermoplastic electron beam crosslinked

Thin specimens electron-beam interactions

Two-sided irradiation of a wire by electron beam

Types of Electron-Beam Lithographies

Ultraviolet and Electron Beam Cured Epoxy Adhesives

Vacuum deposition techniques electron beam evaporation

Vacuum-electron-beam exposure

Wavelength of electron beam

Welding electron beam

What is Electron Beam Processing

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