Principles of Electron-beam and HF-Plasma SNMS

The basic principle of e-beam SNMS as introduced by Lipinsky et al. in 1985 [3.60] is simple (Fig. 3.30) - as in SIMS, the sample is sputtered with a focused keV ion beam. SN post-ionization is accomplished by use of an e-beam accelerated between a filament and an anode. The applied electron energy Fe a 50 20 eV is higher than the range of first ionization potentials (IP) of the elements (4—24 eV, see Fig. 3.31). Typical probabilities of ionization are in the 0.01% range. SD and residual gas suppression is achieved with electrostatic lenses before SN post-ionization and energy filtering, respectively. 

3 Electron-impact (El) Secondary Neutral Mass Spectrometry (SNMS) 1125 

Positive secondary ions (SI ) are repelled by an electrode in e-beam SNMS or completely (in DBM) or widely (in HFM, see below) re-attracted by the sample surface in HF-plasma SNMS. Ionized plasma species (Ar , contamination) are suppressed by energy filtering. 

Multiplier I Deflector - -. Quadrupole. Ion optics Viev/port Valve.  

The gas temperature of the Ar plasma in the range of 600 100 K effects temperatures of water or LN2 cooled samples of 350 30 or 200 30 K, respectively. In addition, C, N, and O species are desorbed from the chamber walls and introduced samples, effecting a plasma contamination level in the 0.01-0.1% range. 

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