Electron beam, evaporation

Overlay coatings onto gas-turbine blades and vanes of M—Cr—Al—Y type alloys by electron beam evaporation is estimated at 10 x 10 to coat 200,000 parts at an average cost of 50 per part. 

The most common Schottky contacts for compound semiconductors are gold-based metallizations deposited by thermal or electron beam evaporation. The metal may include a thin titanium layer in direct contact with the semiconductor which acts as an adhesion layer. AdditionaHy, a thin layer... 

Alternative Thin-Film Fabrication Approaches. Thin films of electronic ceramic materials have also been prepared by sputtering, electron beam evaporation, laser ablation, chemical beam deposition, and chemical vapor deposition (CVD). In the sputtering process, targets may be metal... 

When LiMn204 electrodes are deposited as thin films on a platinum substrate, either by electron-beam evaporation or radiofrequency (rf) sputtering, structures are sometimes formed that exhibit unusual electrochemical behavior [146, 147]. Such electrodes have been evaluated in solid-... 

These materials are produced in monolithic form or as coatings. The coatings are generally applied by CVD on ceramic substrates and by sputtering, electron-beam evaporation, or ion-beam assisted deposition on steel substrates (see Appendix). 

Alloy coating of turbine components by electron-beam evaporation and sputtering. 

Spherical rollers were machined from AISI 52100 steel, hardened to a Rockwell hardness of Rc 60 and manually polished with diamond paste to RMS surface roughness of 5 nm. Two glass disks with a different thickness of the silica spacer layer are used. For thin film colorimetric interferometry, a spacer layer about 190 nm thick is employed whereas FECO interferometry requires a thicker spacer layer, approximately 500 nm. In both cases, the layer was deposited by the reactive electron beam evaporation process and it covers the entire underside of the glass disk with the exception of a narrow radial strip. The refractive index of the spacer layer was determined by reflection spectroscopy and its value for a wavelength of 550 nm is 1.47. 

Physical vapor deposition Electron-beam evaporation Electroplating Reactive ion etching Wet etching Molecular beam epitajty Chemical-mechanical polishing Rapid thermal processing Vacuum sealing... 

Both characteristic X-ray line and continuous spectra were used to evaluate the performances of the resists. To determine exposure parameters (i.e. sensitivity and contrast) irradiations were carried gut in this study using the aluminum Kot- 2 emission line at 8.3t A generated by means of a modified Vacuum Generators Limited model EG-2 electron beam evaporation gun. The resist samples were exposed through a mask (A) consisting of a range of aluminum foils of different thicknesses supported on an absorbing nickel frame in order to vary the X-ray flux. 

Films of SrS HoF3, useful as white EL devices, were deposited by electron beam evaporation of SrS pellets and HoF3 powder.164... 

The other platform is dielectrics, for example, silicon dioxide, silicon nitride, silicon oxynitride, tantalum pentoxide, and titanium dioxide. They can be deposited by various methods, such as plasma-enhanced chemical vapor deposition, thermal evaporation, electron-beam evaporation, and sputtering. There are a number of dielectrics with refractive indices ranging from 1.45 to 2.4, facilitating diverse waveguide designs to satisfy different specification. Dielectrics have two other... 

Thickness Measurement. The thickness of poly(I) at different coverages was obtained using a Tencor alpha-step 100 surface profile measuring system. Electrodes used were glass slides coated with Pt by electron beam evaporation. In order to produce a "step" across which the stylus of the surface profiler was drawn, Apiezon N grease was applied to part of the electrode surface and was removed with CH2CI2 after derivatization with poly(I). 

R. Banerjee and D. Das, Properties of tin oxide films prepared by reactive electron beam evaporation, Thin Solid Films, 149 291-301, 1987. 

The electron-beam guns may also be integral parts of several special pieces of equipment. Electron-beam evaporation and the related directed vapour deposition technology are relevant examples. 

In view of the complexity of real supported catalysts, consisting of randomly oriented and irregularly shaped metal particles on high surface area porous supports, well oriented and regularly shaped metal particles grown on planar thin supports are frequently used as model catalysts [19]. This facilitates the study by surface science and TEM techniques [11, 74, 75]. In the present work, Pt particles were grown at 623 K by electron beam evaporation of Pt at a pressure of 10 mbar on vacuum-cleaved (001) NaCl... 

In physical vapor-deposited as well as sputter-deposited films, incorporated gases can also increase stress and raise annealing temperatures. Similar effects are present in electron beam-evaporated films. 

Figure 27 RBS/C spectra of 2.7-MeV-He from Nb(l 10) epitaxial film on a-Al203 substrate [Nb (140 nm)/Cu (42 nm)/Nb (48 nm)/a-Al203]. The 100-nm-thick Nb films were fabricated at 750°C by electron beam evaporation.

From the comparison of phases of synthesized UFPs with those of residual materials after vaporizing in N2 and NH3 gas, the following process can be suggested for the formation of nitride UFPs by the electron beam evaporation ... 

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