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Photo electron-beam lithography

Includes Pattern generator, photo-repeater, electron-beam lithography and contact printer... [Pg.323]

The design of the most advanced microelectronic devices now requires with sub-half micron dimensions. Photo, electron beam and x-ray lithographies are all candidates for patterning at such resolution. Resist resolution, along with relief image wall profiles and contrast must be improved and controlled in order for the fabrication of such devices to become practical. [Pg.463]

See other pages where Photo electron-beam lithography is mentioned: [Pg.239]    [Pg.137]    [Pg.146]    [Pg.375]    [Pg.4]    [Pg.214]    [Pg.25]    [Pg.45]    [Pg.12]    [Pg.220]    [Pg.65]    [Pg.116]    [Pg.388]    [Pg.23]    [Pg.159]    [Pg.30]    [Pg.198]    [Pg.109]    [Pg.465]    [Pg.41]    [Pg.83]    [Pg.161]    [Pg.235]    [Pg.474]    [Pg.399]    [Pg.210]    [Pg.73]    [Pg.244]    [Pg.70]   
See also in sourсe #XX -- [ Pg.235 ]



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