Hybridized resistive/electron beam

Rotatable units offering various options for vapor sources, reaction vessesls, vacuum stations and ligand inlet configurations are offered commercially.(17,18,27) The Planar apparatus(17) utilizes a variable pitch, 5"-45"-horizontal 10 L glass flask which accepts single, twin and mixed vapor sources like those provided for its static models. The hybridized resistive/electron beam furnace... 

Figure 11.49 Effect of electron-beam curing of resists based on poly(methacrylate) platform and hybrid methacrylate/alicyclic polymer platform on polygate etch. Electron-beam curing improves etch resistance by up to 50% relative to the control (uncured) sample. Processing was done in a nitrogen environment of the ElectronCure Electron Beam Process Chamber utilizing these electron-beam parameters 3.75 keV, 6 mA, 2000 pC/cm. The wafer temperature of the standard (Std.) process was not controlled, that for the electron-beam standard cure (ESC) process was kept at a medium temperature, that for the low-temperature (LT) process was maintained at a iow temperature, whiie that for the control was at room temperature. [After R. Dammel, Practical resist processing, SPIE Short Course No. SC616 (2005).]...

Brusatin, G., Guglielmi, M., and Romanato, F. (2009) Electron beam lithography of hybrid sol-gel negative resist. Microelectron. Eng., 86 (4-6), 745-748. 

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