Electron beam etching

Osada, T., Arakawa, H., Ichikawa, M., and Ikai, A., Atomic force microscopy of histological sections using a new electron beam etching method. J. Microsc. 189, 43-49 (1998). 

This entry is just an introduction there have been numerous other developments of advanced micro /nanofabrication techniques including ion-assisted CVD electron beam etching, for example, to produce nanopores [50] and custom AFM/ STM probes for scanning electrochemical imaging [51] and materials for sensing at high temperatures and in corrosive environments. 

Decades passed before it was technologically possible to mimic such nano-strncmres and fabricate artificial bionic moth eye ARS [191, 194]. Technologically, moth eyes can be produced at a correct scale using lithography, crossing three gratings at 120°. Another approach to fabrication is electron-beam etching. 

The chill-roll touched surface of the cast film consists of a-rich layer which is air-ti t after stretching in spite of the inner layer being porous. Consequently, the whole film behave as less porous film. During the electron-microscopic observation electron beam etched the air-tight layer, then the porous stnicture of film can be viewed. 

Physical vapor deposition Electron-beam evaporation Electroplating Reactive ion etching Wet etching Molecular beam epitajty Chemical-mechanical polishing Rapid thermal processing Vacuum sealing... 

Figure 11.11. Integration of nanowire photonics with silicon electronics. Schematic illustrating fabrication of hybrid structures. A silicon-on-insulator (SOI) substrate is patterned by standard electron-beam or photolithography followed by reactive ion etching. Emissive NWs are then aligned onto the patterned SOI substrate to form photonic sources. [Reprinted with permission from Ref. 59. Copyright 2005 Wiley-VCH Verlag.]...

Figure 13.6. Effects of stress concentration on breakability. Scanning electron micrographs (top frames) showing breaks of anchored silicon beams etched with (a) plasma, (b) KOH and isopropyl alcohol, and (c) KOH and optical micrographs (bottom frames) of printing results that demonstrate the relative ease of breakability, or the ability for a stamp to separate elements from the anchoring structures in each system. (Reprinted with permission from Ref. 54. Copyright 2007 American Institute of Physics.)...

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