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Electron beam lithography applications

New promising technologies for future electron-beam lithography applications based on pyroelectrically induced electron emission from LiNbOs ferroelectrics [22] were recently proposed [23], The developed system possessing micrometer scale resolution used 1 1 electron beam projection. The needed electron pattern was obtained by means of deposited micrometer-size Ti-spots on the polar face of LiNbOs. Another solution for the high resolution electron lithography may be found in nanodomain patterning of a ferroelectric template. [Pg.192]

Application to image reversal process a)Electron beam lithography... [Pg.177]

Electron sources applicable to electron beam lithography are the same as those used in conventional electron microscopes. These sources can be divided into two groups-thermionic or field emission-depending on the way in which they emit electrons 58,59). Thermionic guns rely on the... [Pg.68]

In other studies on MOS structures, the two types of hysteresis, normal and abnormal, are suggested to arise from the ion displacement in the insulator and to the trapping at the interface states. The presence of site-radiation-induced polymerization has been used to provide increased film stability and has been described as an application for high-resolution electron beam lithography for the fabrication of microcircuitry. [Pg.98]

Conventional patterning techniques, for example, photolithography and electron beam lithography, are frequently used for fabrication of patterned substrates owing to their capability to produce nanometer features with remarkable perfection. However, the slow process of electron beam lithography has limited most of its application fabricating high-end devices.69,70... [Pg.419]

Vieu C, Carcenac F, Pepin A. Electron beam lithography Resolution limits and applications Appl Surf Sci 2000 164 111-7(7). [Pg.719]

Komuro, M. Hiroshima, H. Kobayashi, K. Miyazaki, T. Ohyi, H. Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography. Jpn. J. Appl. Phys. 1 (Regular Papers Short Notes Review Papers) 2000, 39 (12B), 7070-7074. [Pg.1801]

Fig. 4.6. General lithographic fabrication procedure, applicable to both electron-beam lithography and colloidal lithography... Fig. 4.6. General lithographic fabrication procedure, applicable to both electron-beam lithography and colloidal lithography...

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See also in sourсe #XX -- [ Pg.330 ]




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