Electron beam lithography fabricated devices

A similar route has been followed most recently by Weiss et al. who have fabricated a multi-island SE device from self-assembled ID gold nanocrystal chains [28]. They assembled thiol-stabilized 50 nm Au particles in a chainlike structure and used subsequently electron-beam lithography for electrode fabrication. Here it has to be... 

King, M. C. IEEE Trans. Electron Devices, 1979, ED-26, 711. Herriott, D. R. Brewer, G. R. "Electron-Beam Lithography Machines" in Electron-Beam Technology in Microelectronic Circuit Fabrication, Academic Press, New York, New York, 1981 pp 141-216. 

Particularly in 2D systems, control over the self-assembly of colloidal templates has offered a versatile way to produce patterned surfaces or arrays with a precision of few nanometres. Diblock copolymer micellar nanolithography (dBCML) is a versatile method that uses homopolymers or block copolymers for the production of complex surface structures with nanosized features [69], In contrast to other approaches like electron-beam lithography (EBL) and photolithography, dBCML does not require extensive equipment. In fact, it is commonly used in the fabrication of data storage devices and photonic crystals, in catalyses [70], and for the design of mesoporous films and nanoparticle arrays [71]. 

Conventional patterning techniques, for example, photolithography and electron beam lithography, are frequently used for fabrication of patterned substrates owing to their capability to produce nanometer features with remarkable perfection. However, the slow process of electron beam lithography has limited most of its application fabricating high-end devices.69,70... 

Electron-beam lithography (EBL) refers to a lithographic patterning technique in which a focused beam of electrons is used to expose and pattern resist-coated semiconductor substrates as part of a number of steps used in the fabrication of IC devices. Its introduction into IC fabrication dates back to 1957. Today, electron-beam lithography is used primarily in fabrication of masks used in optical lithography and x-ray lithography. It is also used in low-volume fabrication of exploratory IC device layers with extremely small features it has also found application in nanotechnology research. 

Yariv, A., C. Zhang, L.R. Dalton, Y. Huang, and G.T. Paloczi. 2004. Fabrication and replication of polymer integrated optical devices using electron-beam lithography and soft lithography. / Phys Chem B 108 8006-8013. 

As shown in Fig. 2,15, we created a sample device to experimentally demonstrate the retrieval of a nanophotonic code within an embossed hologram. The entire device structure, whose size was 15 mm x 20 mm, was fabricated by electron-beam lithography on an Si substrate, followed by sputtering a 50 nm-thick Au layer, as schematically shown in the cross-sectional profile in Fig. 2.15b. 

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