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Electron-beam deposition

Keller D and Chou C C 1992 Imaging steep, high structures by scanning force microscopy with electron beam deposited tips Surf. Sol. 268 333... [Pg.1727]

The hybridizing component can also be formed directly on the surface of a pristine or modified nanocarbon using molecular precursors, such as organic monomers, metal salts or metal organic complexes. Depending on the desired compound, in situ deposition can be carried out either in solution, such as via direct network formation via in situ polymerization, chemical reduction, electro- or electroless deposition, and sol-gel processes, or from the gas phase using chemical deposition (i.e. CVD or ALD) or physical deposition (i.e. laser ablation, electron beam deposition, thermal evaporation, or sputtering). [Pg.134]

TappingMode scanning techniques, (3) improved AFM probes (such as standard silicon nitride probes modified by electron beam deposition and... [Pg.140]

Other coating processes involving fluoridated apatite have been investigated to improve the long-term adhesion and promote osteointegration of cementless titanium-based metal implants pulsed laser deposition, electron beam deposition and ion beam sputter deposition techniques, and sol-gel methods, for example. They lead to fluor-containing calcium phosphates (apatites in most cases) with different compositions and crystallinity states. [Pg.313]

Any dosimeter used to determine absorbed dose in an irradiated product has to be calibrated. The adiabatic character of electron beam deposition is used in calorimetry, which is the primary absolute method of measuring the absorbed dose (energy per unit mass). An example of the instrument for this purpose is the water calorimeter developed in Ris0 National Laboratory in Denmark. " This calorimeter is reported to be suitable for electrons from a linear accelerator with energies higher than 5 MeV and... [Pg.219]

Copper 18 mm diameter discs were utilized as substrates for glucose detection. After cleaning, approximately 10 lL of the nanosphere suspension (4% solids, 390 nm diameter) was drop coated onto each copper substrate and allowed to dry in ambient conditions.58 The substrates were then mounted into an electron beam deposition system for metal deposition (Kurt J. Lesker, Clairton, PA). Silver metal films (dm = 200 nm) were deposited over and through the sphere masks on the substrates.58 59... [Pg.428]

Pulsed electron beam deposition (PED) Pulsed electron beam source emitting 100 ns long electron pulses with 10-20 keV and kA intensity into the deposition chamber, no excimer laser is required, innovative complimentary technique to PLD, further extending the range of materials to be grown as thin films by pulsed energy techniques [128,135]... [Pg.347]

Fig. 1. Optical absorption spectra for various a-Si films ar.d laser treatments. E440 represents the absorption coefficient for electron-beam-deposited a-Si at 440°C substrate temperature, whereas LA and LC represent the laser-annealed and laser-crystallized spectra, respectively. The absorptivity curve of the CVD film is from Janai and Moser (1982) after pulse crystallization the curve PLA was measured. Fig. 1. Optical absorption spectra for various a-Si films ar.d laser treatments. E440 represents the absorption coefficient for electron-beam-deposited a-Si at 440°C substrate temperature, whereas LA and LC represent the laser-annealed and laser-crystallized spectra, respectively. The absorptivity curve of the CVD film is from Janai and Moser (1982) after pulse crystallization the curve PLA was measured.
A new technique is under development for depositing metal onto a ceramic substrate (e.g., ceramic membrane) at room temperature. This ion vapor deposition process combines ion implementation and electron beam deposition [Anonymous, 1988]. The ceramic substrate is irradiated with argon or nitrogen ions while the metal is vaporized by an electron beam and deposited onto the ceramic surface. The ion implementation directs the metal to the surface to be joined. [Pg.389]

Sections of wing samples from Cicadetta cells cicadas were coated in a layer of high purity (99.99%) silver 60 nm thick using a Kurt J Lesker CMS-18HV electron beam deposition system controlled by a quartz crystal microbalance. These cicada wing substrates were found to produce a SERS enhancement factor of 10 when self-assembled monolayers of thiophenol were formed on their metalized surfaces. More recent work by Kostovski et al. has focused on... [Pg.86]

It was discovered by Sawabe and co-workers [10, 405] by DC plasma CVD that diamond grows heteroepitaxially on Ir(lOO). A single crystal Ir(lOO) film for a substrate was deposited on MgO(lOO) of 10-mm square by electron beam deposition at the substrate temperature of 750 °C, and then annealed in vacuum for 60 min at 950 °C. The Ir film thickness was 500 nm. The setup of the DC plasma CVD reactor that has the third electrode between the anode and the cathode for bias application has been shown in Figure 4.2. [Pg.251]

Fignre 5.2f and g shows the metalhzation process on the 3-D microstmctnres. By spray coating, the photoresist fihn is formed on the 3-D topographic stmctnres and patterned by photolithography, (f) Ti/An for cnrrent coUectors is formed by electron-beam deposition and snbseqnent lift-off process, (g) Catalyst layers of the anode and cathode are formed by electroplating Pt-Rn for the anode and Pt for the... [Pg.51]

M. Levichkova, V. Mankov, N. Starbov, D. Karashanova, B. Mednikarov, and K. Starbova, Structure and properties of nanosized electron beam deposited zirconia thin films, Surf. Coat. Technol. 141, 70-77 (2001). [Pg.195]

These are produced by several conversion processes (evaporation, sputtering, chemical plasma deposition). Evaporation is the same method as that used to create metallisation using aluminium. A material is heated in a crucible by either a resistive heat or an electron beam gun (hence the name electron beam deposition), whereby the material evaporates and subsequently condenses on a chilled film in a vacuum chamber. In the case of Sit), coatings, the aluminium used in metallisation is replaced by SiO/Si02. [Pg.282]

There are several potential disadvantages to electron beam deposition ... [Pg.38]

Key words Solid Oxide Fuel Cells/Electron Beam Deposition/Porosity/Zirconia Ceramics... [Pg.73]

Decreasing operation temperature of solid oxide fuel cells (SOFCs) and electrocatalytic reactors down to 800-1100 K requires developments of novel materials for electrodes and catalytic layers, applied onto the surface of solid electrolyte or mixed conducting membranes, with a high performance at reduced temperatures. Highly-dispersed active oxide powders can be prepared and deposited using various techniques, such as spray pyrolysis, sol-gel method, co-precipitation, electron beam deposition etc. However, most of these methods are relatively expensive or based on the use of complex equipment. This makes it necessary to search for alternative synthesis and porous-layer processing routes, enabling to decrease the costs of electrochemical cells. Recently, one synthesis technique based on the use... [Pg.223]


See other pages where Electron-beam deposition is mentioned: [Pg.115]    [Pg.122]    [Pg.367]    [Pg.600]    [Pg.531]    [Pg.313]    [Pg.329]    [Pg.95]    [Pg.205]    [Pg.425]    [Pg.242]    [Pg.243]    [Pg.213]    [Pg.346]    [Pg.579]    [Pg.5978]    [Pg.85]    [Pg.1666]    [Pg.26]    [Pg.281]    [Pg.310]    [Pg.304]    [Pg.1707]    [Pg.639]    [Pg.5977]    [Pg.488]    [Pg.38]    [Pg.60]   
See also in sourсe #XX -- [ Pg.579 ]

See also in sourсe #XX -- [ Pg.645 ]

See also in sourсe #XX -- [ Pg.73 ]




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Coating electron beam physical vapor deposition

Electron beam

Electron beam physical vapor deposition

Electron beam physical vapor deposition EB-PVD)

Electron beam physical vapour deposition

Electron beam-induced deposition

Electron- and Ion Beam-Assisted Deposition (EBAD, IBAD)

Electron-beam evaporation, metal deposition onto

Pulsed electron beam deposition

Vacuum deposition techniques electron beam evaporation

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