Polymer electron-beam vinyl resist

The negative electron beam resists as shown in Table VII are based on vinyl polymers —... 

Pittman, M. Ueda, C. Chen, C. Cook, J. Helbert, and J. Kwiatkowski, Synthesis, radiation degradation, and electron beam resist behavior of fluorine containing vinyl polymers, J. Electro chem. Soc. 128, 1759 (1981) M. Kakuchi, S. Sugawara, K. Murase, and K. Matsuyama, Polymeric resist mask composition, U.S. Patent No. 4,125,672 (1978). 

Vinyl acetate and 3-methyIcyclopentene-S02 terpolymers have also been reported to be usehil as electron beam resist mediums [61c]. The polymer obtained is a VAc/3-methyIcyclopentene/S02 terpolymer. This terpolymeriza-tion was reported to occur at — 60°C using f-BuOOH as the initiator. 

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