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Electron beam lithography conduction

Application of conducting polymers, which may also be of advantage for electron-beam lithography. [Pg.236]

Also worthy of mention is the introduction of conductive electron-beam resists that eliminate the charging effect that is so troublesome in electron-beam lithography. Todokaro et al. accomplished this by using a partially chloromethylated poly(diphenylsiloxane) as the top imaging resist in a bilayer system, and using the ionically conductive ammonium salt of poly(p-styrene sulfonate) (XXI) as the bottom layer. [Pg.224]

Todokaro, A. Kajiya, and H. Watanabe, Conductive two layer resist system for electron beam lithography, J. Vac. Set Technol. B 6, 357 (1988). [Pg.224]

M. Angelopoulos, J. M. Shaw, R. D. Kaplan, S. Perreault, Conducting polyanilines discharge layers for electron-beam lithography, Journal of Vacuum Science and Technology, B 1989, 7,1519. [Pg.73]

H. Tomozawa, Y. Saida, Y. Ikenoue, F. Murai, Y. Suzuki, T. Tawa, Y. Ohta, Properties and application of conducting polymer on electron-beam lithography, Journal of Photopolymer Science and Technology 1996, 9, 707. [Pg.73]

See other pages where Electron beam lithography conduction is mentioned: [Pg.119]    [Pg.48]    [Pg.352]    [Pg.29]    [Pg.624]    [Pg.146]    [Pg.189]    [Pg.98]    [Pg.44]    [Pg.35]    [Pg.106]    [Pg.374]    [Pg.311]    [Pg.470]    [Pg.410]    [Pg.375]    [Pg.299]    [Pg.1792]    [Pg.196]    [Pg.409]    [Pg.486]    [Pg.8]    [Pg.27]    [Pg.72]    [Pg.229]    [Pg.10]    [Pg.269]    [Pg.1859]    [Pg.292]    [Pg.538]    [Pg.50]    [Pg.65]    [Pg.225]    [Pg.377]    [Pg.105]    [Pg.114]    [Pg.990]    [Pg.245]    [Pg.372]    [Pg.254]   
See also in sourсe #XX -- [ Pg.277 ]



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Conductance electronic

Conducting electrons

Conduction electrons

Conductivity: electronic

Electron beam

Electron conductance

Electron conductivity

Electron lithography

Electronic conduction

Electronically conducting

Electronics conduction

Lithography electron beam

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