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Lithography nanolithography electron-beam

Particularly in 2D systems, control over the self-assembly of colloidal templates has offered a versatile way to produce patterned surfaces or arrays with a precision of few nanometres. Diblock copolymer micellar nanolithography (dBCML) is a versatile method that uses homopolymers or block copolymers for the production of complex surface structures with nanosized features [69], In contrast to other approaches like electron-beam lithography (EBL) and photolithography, dBCML does not require extensive equipment. In fact, it is commonly used in the fabrication of data storage devices and photonic crystals, in catalyses [70], and for the design of mesoporous films and nanoparticle arrays [71]. [Pg.88]

Nano-RPS systems have found great potentials in biomolecule analysis such as DNA and proteins at the single-molecule level. In order to obtain a nanosized sensing channel, nanolithography techniques, such as electron beam lithography (EBL), focused ion beam (FIB), and even natural nanopores, have been introduced. Although these techniques... [Pg.2000]


See other pages where Lithography nanolithography electron-beam is mentioned: [Pg.285]    [Pg.113]    [Pg.391]    [Pg.106]    [Pg.159]    [Pg.266]    [Pg.689]    [Pg.144]    [Pg.480]    [Pg.388]    [Pg.27]    [Pg.3629]    [Pg.3637]    [Pg.46]    [Pg.401]    [Pg.607]    [Pg.191]    [Pg.1209]    [Pg.245]   


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