Electron-beam nano-lithography

Sun, S., and G.J. Leggett. 2004. Matching the resolution of electron beam lithography by scanning near-field photolithography. Nano Lett. 4 1381-1384. 

For single-nanowire devices, highly expensive techniques (such as a focused ion beam, or a series of nano-lithographic tools) must be used, ranging from proton and electron beam nanoUthography, in which patterned substrates are obtained under the application of a charged particle beam, to nano-imprint lithography. ... 

The nano-antennas where fabricated on top of a 200 nm silicon dioxide layer on a standard silicon wafer. The substrate was spin coated with high resolution positive PMMA 950 K resist and electron beam lithography was used to define the nano-antenna structures. After exposure, the samples where developed in a M1BK 1PA solution with a 1 3 composition. Finally, silver was thermally evaporated and Ufted-off to remove of the unwanted residual metal areas. The total number of nano-antennas created was 6.25 x 10 distributed over an area of 2.13 mm. Although the final array of nano-antennas was laid on top of a dielectric layer of silicon dioxide, the silicon substrate obstructed the transmitted light. In Fig. 1.21, SEM pictures at different magnifications show the obtained results through this process. The two transversal nano-antennas in an L shape form a... 

Nano-RPS systems have found great potentials in biomolecule analysis such as DNA and proteins at the single-molecule level. In order to obtain a nanosized sensing channel, nanolithography techniques, such as electron beam lithography (EBL), focused ion beam (FIB), and even natural nanopores, have been introduced. Although these techniques... 

Decades passed before it was technologically possible to mimic such nano-strncmres and fabricate artificial bionic moth eye ARS [191, 194]. Technologically, moth eyes can be produced at a correct scale using lithography, crossing three gratings at 120°. Another approach to fabrication is electron-beam etching. 

Yang, X., Wan, L. et al. (2010) Directed block copolymer assembly versus electron beam lithography for bit-patterned media with areal density of 1 terabit/inch and beyond. ACS Nano, 3,1844. 

Nanofabrication is the collection of techniques that generates reproducible patterns whose elements have sizes of 100 nm or less in at least one dimension. The majority of commercial nanofabrication takes place in the semiconductor industry. Essentially all integrated circuits are made hy a combination of electron-beam lithography (EBL), which generates nanoscale information in the form of features on photomasks, and photolithography, which replicates that information. We refer to these techniques as conventional methods of nano-fabrication. They are the workhorses of modem microelectronics, and are not likely to he replaced in the foreseeable future. Despite the ubiquity of scanning beam and photolithographic methods in commercial produaion, there are many circumstances outside of microelectronics where conventional techniques are prohihitively expensive, tm-available, or inapplicable. Further, processes developed for... 

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