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Oxidation films

Studies have been made on the rate of growth of oxide films on different crystal faces of a metal using ellipsometric methods. The rate was indeed different for (100), (101), (110), and (311) faces of copper [162] moreover, the film on a (311) surface was anisotropic in that its apparent thickness varied with the angle of rotation about the film normal. [Pg.283]

Corrosion protection of metals can take many fonns, one of which is passivation. As mentioned above, passivation is the fonnation of a thin protective film (most commonly oxide or hydrated oxide) on a metallic surface. Certain metals that are prone to passivation will fonn a thin oxide film that displaces the electrode potential of the metal by +0.5-2.0 V. The film severely hinders the difflision rate of metal ions from the electrode to tire solid-gas or solid-liquid interface, thus providing corrosion resistance. This decreased corrosion rate is best illustrated by anodic polarization curves, which are constructed by measuring the net current from an electrode into solution (the corrosion current) under an applied voltage. For passivable metals, the current will increase steadily with increasing voltage in the so-called active region until the passivating film fonns, at which point the current will rapidly decrease. This behaviour is characteristic of metals that are susceptible to passivation. [Pg.923]

Thin oxide films may be prepared by substrate oxidation or by vapour deposition onto a suitable substrate. An example of the fomrer method is the preparation of silicon oxide thin-films by oxidation of a silicon wafer. In general, however, the thickness and stoichiometry of a film prepared by this method are difficult to control. [Pg.941]

Shanthi E, Dutta V, Baneqee A and Chopra K L 1980 Electrical and optical properties of undoped and antimony-doped tin oxide films J. Appi. Rhys. 51 6243-51... [Pg.1798]

Gundlach K H and Kadlech J 1974 The influence of the oxide film on the current in AI-AI oxide-fatty acid monolayer-metal functions Chem. Phys. Lett. 25 293-5... [Pg.2631]

Considering the case of pH > 9, the fonnation of an oxide film is favoured compared with Fe dissolution. [Pg.2717]

In tenns of an electrochemical treatment, passivation of a surface represents a significant deviation from ideal electrode behaviour. As mentioned above, for a metal immersed in an electrolyte, the conditions can be such as predicted by the Pourbaix diagram that fonnation of a second-phase film—usually an insoluble surface oxide film—is favoured compared with dissolution (solvation) of the oxidized anion. Depending on the quality of the oxide film, the fonnation of a surface layer can retard further dissolution and virtually stop it after some time. Such surface layers are called passive films. This type of film provides the comparably high chemical stability of many important constmction materials such as aluminium or stainless steels. [Pg.2722]

Highly protective layers can also fonn in gaseous environments at ambient temperatures by a redox reaction similar to that in an aqueous electrolyte, i.e. by oxygen reduction combined with metal oxidation. The thickness of spontaneously fonned oxide films is typically in the range of 1-3 nm, i.e., of similar thickness to electrochemical passive films. Substantially thicker anodic films can be fonned on so-called valve metals (Ti, Ta, Zr,. ..), which allow the application of anodizing potentials (high electric fields) without dielectric breakdown. [Pg.2722]

Figure C2.8.5. Growth of an oxide film on a metal surface, (a) In tire absence of an externally applied potential ... Figure C2.8.5. Growth of an oxide film on a metal surface, (a) In tire absence of an externally applied potential ...
The protective quality of the passive film is detennined by the ion transfer tlirough the film as well as the stability of the film with respect to dissolution. The dissolution of passive oxide films can occur either chemically or electrochemically. The latter case takes place if an oxidized or reduced component of the passive film is more soluble in the electrolyte than the original component. An example of this is the oxidative dissolution of CrjO ... [Pg.2724]

To illustrate some of the different approaches, let us consider passive films grown on Fe-Cr alloys. It has been established since 1911 [72] that an increase of Cr in the alloy increases the stability of the oxide film against dissolution. [Pg.2725]

The percolation argument is based on the idea that with an increasing Cr content an insoluble interlinked cliromium oxide network can fonn which is also protective by embedding the otherwise soluble iron oxide species. As the tlireshold composition for a high stability of the oxide film is strongly influenced by solution chemistry and is different for different dissolution reactions [73], a comprehensive model, however, cannot be based solely on geometrical considerations but has in addition to consider the dissolution chemistry in a concrete way. [Pg.2725]

Other authors have attributed the improved corrosion resistance with increasing Cr content with the increasing tendency of the oxide to become more disordered [69]. This would then suggest that an amoriDhous oxide film is more protective than a crystalline one, due to a bond and stmctural flexibility in amoriDhous films. [Pg.2725]

C2.8.6(c). This increase occurs far below eitlier transpassive dissolution (oxide film dissolution due to tire fonnation of soluble higher oxidation states (e.g. Cr,0., ... [Pg.2727]

In the potential range catliodic to one frequently observes so-called metastable pitting. A number of pit growtli events are initiated, but tire pits immediately repassivate (an oxide film is fonned in tire pit) because the conditions witliin tire pit are such that no stable pit growtli can be maintained. This results in a polarization curve witli strong current oscillations iU [Pg.2728]

C2.18.4.2 DEPOSITION OF OXIDE FILMS BY ATOMIC LAYER PROCESSING... [Pg.2938]

Sheet aluminium can be given a colour by a similar process. The aluminium is first made the anode in a bath of chromic acid (p. 377) when, instead of oxygen being evolved, the aluminium becomes coated with a very adherent film of aluminium oxide which is very adsorbent. If a dye is added to the bath the oxide film is coloured, this colour being incorporated in a film which also makes the remaining aluminium resistant to corrosion. This process is called anodising aluminium. [Pg.151]

Films, anodic oxide Films, passivating Films, plastic Film theory Film wrappers Filter Filter aid Filter aids Filter fabrics Filtering centrifuges Filter media Filters... [Pg.402]

Dry chlorine has a great affinity for absorbing moisture, and wet chlorine is extremely corrosive, attacking most common materials except HasteUoy C, titanium, and tantalum. These metals are protected from attack by the acids formed by chlorine hydrolysis because of surface oxide films on the metal. Tantalum is the preferred constmction material for service with wet and dry chlorine. Wet chlorine gas is handled under pressure using fiberglass-reinforced plastics. Rubber-lined steel is suitable for wet chlorine gas handling up to 100°C. At low pressures and low temperatures PVC, chlorinated PVC, and reinforced polyester resins are also used. Polytetrafluoroethylene (PTFE), poly(vinyhdene fluoride) (PVDE), and... [Pg.510]

Hafnium Acetate. Hafnium acetate [15978-87-7], Hf(OH)2(CH2COO)2, solutions are prepared by reacting the basic carbonate or freshly precipitated hydroxide with acetic acid. The acetate solution has been of interest in preparing oxide films free of chloride or sulfate anions. [Pg.445]

This is essentially a corrosion reaction involving anodic metal dissolution where the conjugate reaction is the hydrogen (qv) evolution process. Hence, the rate depends on temperature, concentration of acid, inhibiting agents, nature of the surface oxide film, etc. Unless the metal chloride is insoluble in aqueous solution eg, Ag or Hg ", the reaction products are removed from the metal or alloy surface by dissolution. The extent of removal is controUed by the local hydrodynamic conditions. [Pg.444]

A rapid method to determine the calcium content of lead alloys is a Hquid-metal titration using lead—antimony (1%) (9). The end point is indicated by a gray oxide film pattern on the surface of a sohdifted sample of the metal when observed at a 45° angle to a light source. The basis for the titration is the reaction between calcium and antimony. The percentage of calcium in the sample can be calculated from the amount of antimony used. If additional calcium is needed in the alloy, the melt is sweetened with a lead—calcium (1 wt %) master alloy. [Pg.59]

If the ECM of titanium is attempted in sodium chloride electrolyte, very low (10—20%) current efficiency is usually obtained. When this solution is replaced by some mixture of fluoride-based electrolytes, to achieve greater efficiencies (> 60%), a higher voltage (ca 60 V) is used. These conditions ate needed to break down the tenacious oxide film that forms on the surface of titanium. It is this film which accounts for the corrosion resistance of titanium, and together with its toughness and lightness, make this metal so useful in the aircraft engine industry. [Pg.308]

Sometimes the formation of oxide films on the metal surface binders efficient ECM, and leads to poor surface finish. Eor example, the ECM of titanium is rendered difficult in chloride and nitrate electrolytes because the oxide film formed is so passive. Even when higher (eg, ca 50 V) voltage is apphed, to break the oxide film, its dismption is so nonuniform that deep grain boundary attack of the metal surface occurs. [Pg.308]

Inasmuch as friction conditions determine the flow characteristics of a powder, coarser powder particles of spherical shape flow fastest and powder particles of identical diameter but irregular shape flow more slowly. Finer particles may start to flow, but stop after a short time. Tapping is needed in order to start the flow again. Very fine powders (fine powder particles to coarser ones may increase the apparent density, but usually decreases the flow quality. Metal powders having a thin oxide film may flow well. When the oxide film is removed and the friction between the particles therefore increases, these powders may flow poorly. [Pg.181]

Probably the most important powder property governing the formation of atomic bonds is the surface condition of the particles, especially with respect to the presence of oxide films. If heavy oxide layers are present, they must be penetrated by projections on the particles. This results in only local rather than widespread bonding. A ductile metal such as iron which has a heavy oxide layer may not form as strong or as many bonds as a less ductile metal. [Pg.182]


See other pages where Oxidation films is mentioned: [Pg.276]    [Pg.297]    [Pg.439]    [Pg.440]    [Pg.941]    [Pg.2723]    [Pg.2725]    [Pg.2725]    [Pg.2726]    [Pg.2728]    [Pg.2729]    [Pg.2938]    [Pg.133]    [Pg.188]    [Pg.62]    [Pg.145]    [Pg.440]    [Pg.433]    [Pg.308]    [Pg.309]    [Pg.313]    [Pg.390]    [Pg.69]   
See also in sourсe #XX -- [ Pg.34 , Pg.339 , Pg.341 ]

See also in sourсe #XX -- [ Pg.49 , Pg.50 ]




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Active electronics, oxide dielectric films

Aluminium alloys continued oxide film

Aluminium continued oxide film

Aluminium oxide film

Aluminum alloys corrosion protective oxide film

Aluminum oxide film

Aluminum oxide film, coating

Aluminum oxide film, protective

Aluminum oxide grain boundary film

Aluminum oxide thin films

Amine oxide films

Amine oxide films characteristics

And oxide film growth

Anodic aluminum oxide film

Anodic iridium oxide film electrodes

Anodic iridium oxide films

Anodic metal oxide films

Anodic oxides passive films

Atmospheric corrosion oxide film

Biodegradation oxidized films

Bismuth oxide films

Bonded films lead oxide

Breakdown oxide film

Capacitance oxide film

Catalysis thin oxide film supports

Ceramic oxides, as dielectric films

Cerium oxide films

Cerium oxide films electrodeposition

Characterization of oxide films

Chemical vapor deposition metal oxide film precursors

Chemiluminescence from oxidized polymer films

Chromium oxide film, protective

Chromium oxide films

Chromium, passive oxide films

Coatings oxide films

Coatings silicon oxide films

Cobalt manganese oxide films

Complex oxide conversion coating films

Compost, oxidized films

Conduction mechanism in semiconducting metal oxide sensing films impact on transduction

Conway oxide films

Copper oxide film

Corrosion oxide films

Crystal structure oxide film

Crystal structure, thin films changes with oxidation

Cupric oxide films

Cuprous oxide films

Cyclic voltammetry oxide film electrodes

Defects zinc oxide films

Dielectric metal oxide films

Electrochemical systems oxide films

Electrochemistry oxide film growth

Electrodes Oxide films

Electronic structure indium oxide film

Europium oxide films

Example Buckling of an oxide film

Fibre surface modification by sol-gel finishes with inorganic oxide films

Field oxide film growth

Film surface changes, oxidation

Film weight gain, oxidation

Film, hydrated aluminum oxide

Film, hydrated aluminum oxide moisture measurement

Films, oxide isolation

Films, oxide passive, oxidizing properties

Films, semiconductor oxide

Friction—Effect of Oxide Films

Gallium zinc oxide films

Grown-on oxide films

Growth of oxide films

Growth of surface oxide films

Growth of thin oxide films

Hydrated passive film, iron oxide

Hydrous oxide films

Imaging oxide film

Impedance oxide film

Indium oxide film

Indium oxide film transparent conductors

Indium-tin oxide films

Inorganic oxide films

Iron oxide films

Iron oxide films, epitaxial

Iron oxide thin films

Iron oxides passive film layer

Kinetics of phosphate films on metal oxide surfaces

Lanthanum oxide films

Lead oxide films

Magnesium alloys oxide film

Mesoporous metal oxide films

Mesoporous tungsten oxide films

Mesoscopic Oxide Semiconductor Films

Metal Oxide-Based Thin-Film Transistors

Metal dusting oxide films

Metal films oxidation

Metal oxide films

Metal oxide films mesoporous crystalline

Metal oxide films, photolithographic

Metal oxide semiconductor based film

Metal oxides, inorganic films

Methanol oxidation reaction thin films

Mixed oxide films

Molten salts oxide films

Nanoporous metal oxide film

Nanostructured Metal Oxide Films

Native oxide film thickness

Native oxide film, characterization

Nature of Protective Metal Oxide Films

Nickel oxide films

Nickel oxide films monolayers

Nickel oxide thin film applications

Nickel oxide thin films

Nitrogen zinc oxide films

Of oxide films

Outer Hydrous Layer on the Passive Oxide Film

Oxidation diamond film

Oxidation film degradation

Oxidation initial, thin film

Oxidation polyethylene film

Oxide Surfaces Single Crystals, Powders, Thin Films

Oxide film characterisation

Oxide film damage

Oxide film formation, on iron

Oxide film growth

Oxide film laser lithography

Oxide film layers, aluminum-based alloys

Oxide film metal deposition

Oxide film porous silicon

Oxide film superlattices

Oxide film theory

Oxide film thickness

Oxide film, defects

Oxide film, electric field

Oxide film, optical constant

Oxide films

Oxide films SILAR-grown

Oxide films Subject

Oxide films alloying effects

Oxide films anodic

Oxide films anodized aluminium

Oxide films applications

Oxide films at a metal surface

Oxide films at high temperatures

Oxide films at metal surfaces

Oxide films atomic layer deposition

Oxide films batteries

Oxide films cation vacancies

Oxide films characterization

Oxide films composition

Oxide films continued

Oxide films continued cation vacancies

Oxide films continued experimental techniques

Oxide films continued formation

Oxide films continued linear rate

Oxide films continued passive

Oxide films continued porous

Oxide films continued protective

Oxide films continued voids

Oxide films continuous

Oxide films dielectric

Oxide films diffusion barriers

Oxide films discontinuous

Oxide films electrical properties

Oxide films electrode materials

Oxide films energies

Oxide films erosion-corrosion

Oxide films flat surfaces

Oxide films formation, efficiency

Oxide films growth laws

Oxide films growth rate

Oxide films layers

Oxide films linear rate constant

Oxide films mass transport

Oxide films on aluminium

Oxide films on tantalum

Oxide films parabolic rate constant

Oxide films penetration

Oxide films photosynthesis

Oxide films pore formation

Oxide films porous, metal dissolution

Oxide films positive holes

Oxide films properties

Oxide films rate laws

Oxide films reduction

Oxide films removal

Oxide films solution-derived

Oxide films sputter-deposition

Oxide films stoichiometry

Oxide films stresses

Oxide films surface reactions

Oxide films surfaces Impedance analysis

Oxide films vapour deposited

Oxide films very thin

Oxide films voids

Oxide films volume change

Oxide films, EXAFS studies

Oxide films, formation

Oxide films, grown

Oxide films, on metals

Oxide films, on the metal surface

Oxide thin films, depositing from

Oxide thin films, depositing from solution

Oxides ultrathin films

PECVD silicon oxide film

Palladium oxide films

Particle on oxide film

Passive Oxide Film on Iron

Passive oxide film

Passivity oxide-film

Passivity oxide-film theory

Phosphorus-doped oxide films

Phthalocyanine oxide semiconductors films

Platinum electrodes oxide film

Platinum oxide film formation

Platinum-group metals oxide-film formation

Polycrystals, and mesoporous oxide films

Polymer films oxidized

Polymer films, photosensitized oxidation

Porosity/pores oxide films

Porous Anodic Metal Oxide Films

Porous oxides film, diagrammed

Preparation of zinc oxide (ZnO) films and nanostructures by oxidation

Profilometry oxide film thickness

Reactions of Natural Oxide Films with Water

Rhodium oxide films

Role of Oxide Films

Semiconductors, characteristic oxide films

SiO2 film oxidation

Silicon oxide coated polyester films

Silicon oxide films

Solid oxide fuel cells thin-film

Sputtered oxide films

Sputtering zinc oxide films

Stainless passive surface oxide film

Superconducting oxide films, prepared

Superconducting oxide films, prepared precursors

Surface Films (Such as Oxides)

Surface chemical composition oxide films

Surface oxide film, aluminum-based alloys

Surface oxide films

Surface oxide films, temperature effect

Surfaces passive oxide films

Tantalum oxide films

The Oxide Film—A Protective Barrier

The oxide film

Thermal oxidation films

Thermally Prepared Oxide Films

Thermally grown oxide films

Thermally prepared iridium oxide films

Thick film oxidation

Thick-film zirconium oxide oxygen

Thick-film-based metal-oxide sensors

Thickness of oxide film formed

Thin film oxidation

Thin films metal oxide gels

Thin films tantalum oxide

Thin oxide film formation, metal

Thin oxide film formation, metal chromium

Thin oxide film formation, metal copper

Thin oxide film formation, metal mechanism

Thin oxide film formation, metal nickel

Thin oxide film formation, metal physical

Thin oxide film formation, metal protective layer

Thin oxide film formation, metal silicon

Thin oxide film formation, metal tantalum

Thin oxide film formation, metal values

Thin oxide films

Thin-film micro-oxidation test

Ti/B binary oxide thin films

Ti/Si binary oxide thin films

TiO2 oxide film

Time-resolved terahertz mesoporous oxide films

Titanium oxide film, protective

Titanium oxide films

Titanium oxide films mesoporous

Transparent Conducting Oxides and Thin-Film Transistors

Transparent Oxide Thin Film Transistors

Transparent conducting oxide film

Transport processes in hydrous oxide films

Tris electro-oxidized, LB film, conductivity

Tris oxidized with Br2, LB film, conductivity

Tungsten electrodes, oxide films

Ultrathin oxide films interface

Ultrathin oxide films oxides

Ultrathin oxide films treatments

Yttrium oxide films

Zinc oxide films

Zinc oxide thin films

Zinc oxide thin films piezoelectric properties

Zirconium oxide films

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