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Oxide film laser lithography

Oxide film laser lithography (OFLL) replaces the UV patterned photoresist of TMEMM by laser ablated patterned oxide mask, which is grown anodically on the titanium surface. OFLL can be appUed precisely to nonplanar complex surface and it also allows multilevel patterning. Fig. 12.11 shows that titanium cylinder surface consists of hemispherical cavities which are electrochemically micro-structured using OFLL. However, the process is serial and slower compared to TMEMM. [Pg.229]

Titanium cyiinder surface consists of hemispherical cavities fabricated by oxide film laser lithography [24]. [Pg.230]

P.F. Chauvy, P. Hofftnann, D. Landolt, Applications of laser lithography on oxide film to titanium micromachining, Appl. Surf. Sci. 208 209 (2003) 165 170. [Pg.204]

See other pages where Oxide film laser lithography is mentioned: [Pg.193]    [Pg.193]    [Pg.936]    [Pg.21]    [Pg.22]    [Pg.51]    [Pg.907]    [Pg.431]    [Pg.17]    [Pg.87]    [Pg.172]    [Pg.8]    [Pg.312]    [Pg.384]    [Pg.32]    [Pg.74]    [Pg.187]   
See also in sourсe #XX -- [ Pg.193 , Pg.229 ]



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