And oxide film growth

According to this study, the backbond and dimer-bridge configurations are responsible for the etching and oxide film growth, respectively. However, at low temperature, the... 

Table 9.1 Comparison of data pertaining to the interaction of oxygen with nickel surfaces in the chemisorption and oxide film growth regimes...

Stuckless JT, Wartnaby CE, Al-Sarraf N (1997) St. J. B. Dixon-Warren, M. Kovar, and D. A. King, Oxygen chemisorption and oxide film growth on Ni 100, 110, and 111 Sticking probabilities and microcalorimetric adsorption heats, J. Chem Phys 106 2012... 

Pure tin is completely resistant to distilled water, hot or cold. Local corrosion occurs in salt solutions which do not form insoluble compounds with stannous ions (e.g. chloride, bromide, sulphate, nitrate) but is unlikely in solutions giving stable precipitates (e.g. borate, mono-hydrogen phosphate, bicarbonate, iodide) . In all solutions, oxide film growth occurs and the potential of the metal rises. Any local dissolution may not begin for several days but, once it has begun, it will continue, its presence being manifested... 

T. Yasuda, R. Kuse, K. Iwamoto, K. Tominaga, and J. W. Park, Vapor-liquid hybrid deposition process for device-quality metal oxide film growth, Chem. Mater. 15(22), 4157-4159 (2003). 

Despite the vast quantity of data on electropolymerization, relatively little is known about the processes involved in the deposition of oligomers (polymers) on the electrode, that is, the heterogeneous phase transition. Research - voltammetric, potential, and current step experiments - has concentrated largely on the induction stage of film formation of PPy [6, 51], PTh [21, 52], and PANI [53]. In all these studies, it has been overlooked that electropolymerization is not comparable with the electrocrystallization of inorganic metallic phases and oxide films [54]. Thus, two-or three-dimensional growth mechanisms have been postulated on the basis that the initial deposition steps involve one- or two-electron transfers of a soluted species and the subsequent formation of ad-molecules at the electrode surface, which may form clusters and nuclei through surface diffusion. These phenomena are still unresolved. 

While desorption is operative to some extent at most Semico nductor/electrolyte interfaces, in some cases surface passivation can occur. Here charge transfer across the interface is used to establish covalent bonds with electrolyte species, which results in changes in surface composition. This is typified by the well-known oxide film growth on n-GaP and n-GaAs surfaces in aqueous solutions. In these cases, however, the passivation process can be competed with effectively by the use of high concentrations of other redox species such as the polychalcogenides. 

In molecular models, a surface site is modeled using an analogous molecular reaction. This is the simplest approach, which requires the least amount of computational resources. The selection of a molecule that can more or less adequately reproduce the properties of the surface site under study determines the success or failure of the approach. This approach was used in Ref. [20] in the multiscale simulation of zirconium and hafnium oxide film growth. 

The most stable structures of initial oxidation may be the backbond and dimer bridge structures. Both structures contain di-coordinated oxygen. These two configurations seem to be the initial building blocks of oxide film growth and the key species for surface etching. 

CVD routes to vanadium oxide phases have employed a limited number of metal-organic precursors. VO(acac)2 is the most widely used, and oxide films have been deposited from it by low pressure MOCVD and PECVD. Other precursor for vanadium oxide film growth include VO(OiPr)3 and VO(OEt)3. ... 

Figure 1.31 Model for the texture dependent oxide growth on Zr surfaces. The crystallographic orientation angles of substrate Zr and oxide film Zr02 are given in addition to the electrochemically (photoresist method) determined formation factors [17].

Conductive polymers may be synthesized via either chemical or electrochemical polymerization methods. Electrodeposition of conductive polymers from electrolytes is, thus, feasible provided that the depositing polymer is not soluble in the electrolyte.206 Conductive polymers can be deposited from the electrolytes containing the monomers via either electrooxidation or electroreduction, based on the monomer type used. Similar to that of metals, the electrodeposition of polymers is based on nucleation and growth. The deposition mechanism involves oxidation of monomers adsorbed on the electrode surface, diffusion of the oxidized monomers and oligomerization, formation of clusters, and eventually film growth.213... 

Growth of Plasma-Deposited Phases. Plasma polymerization (22) and anodization are already used extensively in materials processing, although the mechanisms by which these reactions occur are not well characterized. However, they have their counterparts in aqueous electrochemistry in electrochemical polymerization and anodic film growth, respectively. In the case of plasma anodization, the mechanisms of growth of the oxide film are not well understood, nor are kinetic data available for a large number of systems. Considerable research effort is required to obtain the necessary data in order to develop viable mechanisms. 

The tracing of the oxygen species is usually performed by oxidation first in 16C>2 and then 18C>2 enriched gas in the gas/solid interface. Thin ( 20 A) oxide film growths on single crystal metals at moderate temperatures can be studied by oxygen isotope labeling combined with high-resolution microscopy. In the case of liquid/solid and electrochemical interfaces there is another complication that arises from the existence of an electric field and the presence of an electrolyte solution with adsorbable anions and solvents. 

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