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Chemical plasma

G. K. E. Scriba, Phenytoin-Lipid Conjugates Chemical, Plasma Esterase-Mediated, and Pancreatic Lipase-Mediated Hydrolysis in vitro, Pharm. Res. 1993, 10, 1181 — 1186. [Pg.549]

E) G.N. Spokes B.E. Evans, "Ion Sampling from Chemical Plasmas , lOthSympCombstn (1965), pp 639-49... [Pg.474]

Scriba, G K. E. 1993. Phenytoin-lipid conjugates chemical, plasma esterase-mediated, and pancreatic lipase-mediated hydrolysis vitro. Pharm. Res10 1181-1186. [Pg.465]

To obtain a usable adhesive bond with polyolefins, the surface must be treated. A number of surface preparation methods, including flame, chemical, plasma, and primer treatments, are in use. Figure 16.4 illustrates the epoxy adhesive strength improvements that can be made by using various prebond surface treatments to change the critical surface tension of polyethylene. [Pg.372]

The Incorporation of metals Into polymer films produced by plasma techniques Is an attractive prospect since It can be envisaged that careful choice of the metal and organic phases, and close control of the overall composition of the product would greatly extend the scope of these plasma polymerized materials In, for example, electrical, magnetic and optical applications. In a previous paper (1) we have outlined a convenient method for the preparation of such materials derived from fluorinated monomers by simultaneous chemical plasma etching and polymerization in the same system. [Pg.195]

The positive ions therefore arrive at the cathode with increased kinetic energy and material is removed from its surface by competitive physical sputtering, in which momentum transfer to the surface is involved, as well as chemical plasma etching, through the formation of volatile species, which... [Pg.195]

The plasma parameters of f=5 cm mln (at STP), p=0.015 torr and w 100 watts are the same In all cases. The ESCA data Immediately affirm that both molybdenum and copper are Incorporated Into the polymer films although as previously noted the method of cathode erosion must be different In the two cases, (chemical plasma etching versus physical sputtering). Consideration of the relative signal Intensities, corrected for the total relative sensitivities of the core levels, derived from standard homogeneous samples, allows estimates of the empirical formulae to be written for these materials as follows [C3F4 oOo.6 °0.3ln... [Pg.204]

These are produced by several conversion processes (evaporation, sputtering, chemical plasma deposition). Evaporation is the same method as that used to create metallisation using aluminium. A material is heated in a crucible by either a resistive heat or an electron beam gun (hence the name electron beam deposition), whereby the material evaporates and subsequently condenses on a chilled film in a vacuum chamber. In the case of Sit), coatings, the aluminium used in metallisation is replaced by SiO/Si02. [Pg.282]

There are three major processes for applying the silicon oxide coating evaporation, sputtering, and chemical plasma deposition. [Pg.253]

Polyimide, triangular-shaped ESI emitters prepared by lithography, chemical/plasma etching, lamination bonding, or knife-cutting techniques, were fabricated as an extension of chips made of... [Pg.1472]

Sample preparation facilities should include sectioning, grinding, polishing, etching (chemical plasma ion), vacuum glow discharge metallizing, critical... [Pg.891]

The volume is divided into three parts Part I. Metallization Techniques and Properties of Metal Deposits, Part II, Investigation of Interfacial Interactions," and Part III, "Plastic Surface Modification and Adhesion Aspects of Metallized Plastics. The topics covered include various metallization techniques for a variety of plastic substrates various properties of metal deposits metal diffusion during metallization of high-temperature polymers investigation of metal/polymer inlerfacial interactions using a variety of techniques, viz., ESCA, SIMS, HREELS, UV photoemission theoretical studies of metal/polymer interfaces computer simulation of dielectric relaxation at metal/insulalor interfaces surface modification of plastics by a host of techniques including wet chemical, plasma, ion bombardment and its influence on adhesion adhesion aspects of metallized plastics including the use of blister test to study dynamic fracture mechanism of thin metallized plastics. [Pg.378]

He recommended that, if bonding is primarily chemical, plasma treatment should be used on pitch carbon while, if the bonding is primarily physical, HTO should be used. [Pg.262]

FIGURE 22.19 The various rates of via formation based on diameter and method of via ablation, from chemical, plasma, photo and laser techniques. [Pg.497]

Niemi, R., Mahiout, A., Siivinen, J., Mahlberg, R., Likonen, J Nikkola, J., Mannila, J., Vuorio, T., Johansson, L.-S., Soderberg, O., Hannula, S.-P., 2010. Surface pretreatment of austenitic stainless steel and copper by chemical, plasma, electrolytic, or CO2 cryoblasting techniques for sol-gel coating. Surf. Coat. Technol. 204, 2424-2431. [Pg.445]

Atmospheric chemical plasma treatment system for webs... [Pg.30]

Atmospheric chemical plasma treatment systems are typically non-thermal, atmospheric-pressure, glow-discharge plasma systems that generate uniform and homogenous treatments. The level of surface tension and iongevity of treatment are both typically higher than air plasma treatment effects, and similar in treatment effect to flame plasmas. [Pg.30]

While these systems can provide an improvement over air corona, they fall considerably short of the results achievable with atmospheric chemical plasmas. As we will see, atmospheric plasmas create a fourth state of matter which differentiates its surface modification potential beyond what either a corona or chemical corona system can achieve. In turn, the treatment results of an atmospheric plasma system not only outperform corona systems, but they also can offer limitless possibilities. [Pg.32]


See other pages where Chemical plasma is mentioned: [Pg.186]    [Pg.36]    [Pg.37]    [Pg.335]    [Pg.370]    [Pg.2658]    [Pg.196]    [Pg.207]    [Pg.216]    [Pg.282]    [Pg.283]    [Pg.313]    [Pg.253]    [Pg.891]    [Pg.1050]    [Pg.389]    [Pg.814]    [Pg.328]    [Pg.141]    [Pg.3]    [Pg.866]    [Pg.22]    [Pg.250]    [Pg.16]    [Pg.29]    [Pg.29]    [Pg.29]    [Pg.31]   


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Atmospheric chemical plasma

Chemical Plasma Discharge

Chemical analysis plasmas

Chemical interferences plasma emission spectroscopy

Chemical plasma activated

Chemical plasma deposition

Chemical plasma-enhanced

Chemical vapor deposition microwave plasma assisted

Chemical vapor deposition plasma

Chemical vapor deposition plasma polymerization

Chemical vapor deposition plasma process

Chemical vapor deposition plasma-assisted

Chemical vapour deposition plasma enhanced

Chemical vapour deposition plasma-enhanced technique

Chemically reactive plasmas, applications

Electrothermal vaporization inductively coupled plasma chemical modifiers

Energy Balance of Plasma-Chemical NO Synthesis Zeldovich Mechanism Stimulated by Vibrational Excitation

Energy Efficiency of Plasma-Chemical NO Synthesis Excitation and Relaxation Factors

Energy Efficiency of Plasma-Chemical Processes Stimulated by Electronic Excitation and Dissociative Attachment

Energy Transfer Equations in Multi-Component Quasi-Equilibrium Plasma-Chemical Systems

Expanding thermal plasma chemical vapor

Expanding thermal plasma chemical vapor deposition

Globulins, plasma chemical binding

High-temperature plasmas chemical routes

Kinetics plasma-chemical

Microwave plasma assisted chemical vapor

Microwave plasma-enhanced chemical vapor

Microwave-plasma chemical vapor deposition

Modes into Plasma-Chemical Dissociation Process

Nitrides plasma-enhanced chemical vapor

Non-Equilibrium Discharge Conditions and Gas-Phase Plasma-Chemical Processes in the Systems Applied for Synthesis of Diamond Films

Non-Equilibrium Plasma-Chemical Syngas Production from Mixtures of Methane with Carbon Dioxide

PECVD—See Plasma-enhanced chemical

PECVD—See Plasma-enhanced chemical vapor deposition

Plasma ablation enhanced chemical vapor deposition

Plasma chemical aspects

Plasma chemical decomposition

Plasma chemical decomposition of fluoride solutions

Plasma chemical method

Plasma chemical systems

Plasma chemical vaporization machining

Plasma chemical vaporization machining PCVM)

Plasma emission spectroscopy chemical speciation

Plasma enhanced chemical vapor deposition systems

Plasma etching chemical models

Plasma lipoproteins chemical composition

Plasma proteins chemical analysis

Plasma treatment, surface chemical

Plasma treatment, surface chemical materials

Plasma-Chemical Etching Mechanisms and Kinetics

Plasma-Chemical Fuel Conversion and Hydrogen Production

Plasma-Chemical Hydrazine (N2H4) Synthesis from Nitrogen and Hydrogen in Non-Equilibrium Discharges

Plasma-Chemical Kinetics, Thermodynamics, and Electrodynamics

Plasma-Chemical Processes for Final Fabric Treatment

Plasma-Chemical Synthesis of Diamond Films

Plasma-Chemical Synthesis of NF3 and Other Nitrogen Fluorides

Plasma-Chemical Synthesis of O2F2 and Other Oxygen Fluorides

Plasma-Chemical Synthesis of Xenon Fluorides and Other Fluorine Oxidizers

Plasma-Chemical Treatment of Plastics, Rubber Materials, and Special Polymer Films

Plasma-assisted chemical vapour

Plasma-assisted chemical vapour deposition

Plasma-chemical extraction

Plasma-chemical extraction methods

Plasma-chemical extraction technique

Plasma-chemical oxidation

Plasma-chemical reaction

Plasma-chemical reaction elementary

Plasma-chemical reaction frequency

Plasma-chemical reaction mechanism

Plasma-chemical reaction positive ions

Plasma-chemical reaction rate coefficient

Plasma-enhanced chemical PECVD)

Plasma-enhanced chemical vapor

Plasma-enhanced chemical vapor deposition

Plasma-enhanced chemical vapor deposition PE-CVD)

Plasma-enhanced chemical vapor deposition PECVD)

Plasma-enhanced chemical vapor deposition advantage

Plasma-enhanced chemical vapor deposition interactions

Plasma-enhanced chemical vapor deposition microwave

Plasma-enhanced chemical vapor deposition modification

Plasma-enhanced chemical vapor deposition radicals

Plasma-enhanced chemical vapor discharges

Plasma-enhanced chemical vapor surface

Plasma-enhanced chemical vapour

Possible plasma chemical vapor

Possible plasma chemical vapor deposition method

Radio frequency plasma-enhanced chemical

Radio frequency plasma-enhanced chemical vapor deposition

Specific Plasma-Chemical Etching Processes

Surface Chemical Processes of Diamond-Film Growth in Plasma

Surface chemical modification polymeric materials, plasma

Thin film deposition techniques/processing plasma-enhanced chemical vapor

Transfer Phenomena Influence on Energy Efficiency of Plasma-Chemical Processes

Use of Radio-Frequency Plasma Chemical Synthesis

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