Microwave plasma-enhanced chemical vapor deposition

The catalytic chemical vapor deposition (CCVD) technique is far more developed and has great potential to be applied industrially. This technique allows for mass production at lower temperatures than the previously described methods and can be adapted for continuous production [69]. This method consists of decomposing a gas or a liquid precursor, which supplies carbon on catalytic particles (Fe, Ni, Co) in a mbe furnace at temperatures between 500 and 1,100 °C (Fig. 5.4). Besides the classic oven, heated by electric heaters, plasma furnaces (PECVD, Plasma-Enhanced Chemical Vapor Deposition) microwaves (nuCTowave, MW-PECVD), or DC (direct current, dc-PECVD) are also used. 

A large class of coordination compounds, metal chelates, is represented in relation to microwave treatment by a relatively small number of reported data, mainly p-diketonates. Thus, volatile copper) II) acetylacetonate was used for the preparation of copper thin films in Ar — H2 atmosphere at ambient temperature by microwave plasma-enhanced chemical vapor deposition (CVD) [735a]. The formed pure copper films with a resistance of 2 3 pS2 cm were deposited on Si substrates. It is noted that oxygen atoms were never detected in the deposited material since Cu — O intramolecular bonds are totally broken by microwave plasma-assisted decomposition of the copper complex. Another acetylacetonate, Zr(acac)4, was prepared from its hydrate Zr(acac)4 10H2O by microwave dehydration of the latter [726]. It is shown [704] that microwave treatment is an effective dehydration technique for various compounds and materials. Use of microwave irradiation in the synthesis of some transition metal phthalocyanines is reported in Sec. 5.1.1. Their relatives - porphyrins - were also obtained in this way [735b]. 

Y. Liou, A. Inspektor, R. Weimer, and R. Messier, Low-temperature diamond deposition by microwave plasma-enhanced chemical vapor deposition, Appl. Phys. Lett., 55(7) 631-633 (1989)... 

Z. Feng, K. Komvopoulos, I. G. Brown, and D. B. Bogy, Effect of graphitic carbon films on diamond nucleation by microwave-plasma-enhanced chemical-vapor deposition, J. Appl Phys., 74(4) 2841-2849 (1993)... 

Lee JC, Hong BY, Messier R, Collins RW. Nncleation and bulk film growth kinetics of nanocrystaUine diamond prepared by microwave plasma-enhanced chemical vapor deposition on sihcon snbstrates. Appl Phys Lett 1996 69 1716-8. 

Short diamond/carbon whiskers (Figure 6), the first truly discontinuous sheath/core fibers [28], were made by a two step process. The short vapor grown carbon core fibers were produced by pyrolysis of H2/CH4 mixtures in the presence of iron catalysts [25]. These vapor grown carbon fibers were then ultrasonically polished, and diamond was deposited by a microwave plasma-enhanced chemical vapor deposition technique [28]. 

Cui, H., Zhou, O., Zhu, W. and Stoner, B. R., Deposition of aligned bamboo-like carbon nanotubes via microwave plasma enhanced chemical vapor deposition . Journal of Applied Physics, 2000,88, 6072-6074. 

Choi YC, Shin YM, Lee YH, Lee BS, Park GS, Lee NS, et al. Controlling the diameter, growth rate, and density of vertically aUgned carbon nanotubes synthesized by microwave plasma-enhanced chemical vapor deposition. Appl Phys Lett 2000 76 2367-9. 

Zajickova L, Jasek O, Elias M, Synek P, Lazar L, Schneeweiss O, Hanzlikova R (2010) Synthesis of carbon nanotubes by plasma-enhanced chemical vapor deposition in an atmospheric-pressure microwave torch. Pure Appl Chem 82 1259-1272... 

MPCVD Microwave plasma-enhanced chemical vapor deposition N aDB S S odium dodecy Ibenzenesulfonate... 

Kinoshita, H., Kume, I., Sakai, H., Tagawa, M.and Ohmae, N., High growth rate of vertically aligned carbon nanotubes using a plasma shield in microwave plasma-enhanced chemical vapor deposition. Carbon, 42, 2004, XTii-llll. 

Dittmar, A. Kosslick, H. Muller, J.P. Pohl, M.M. (2004). Characterization of Cobalt Oxide Supported on Titania Prepared by Microwave Plasma Enhanced Chemical Vapor Deposition. Surf. Coat Technol, Vol. 182 pp. 35-42 Doblhofer, K. Diirr, W. (1980). Polymer-Metal Composite Thin Films on Electrodes. J. 

Wang, X., Hu, Z., Chen, X., Chen, Y. - Preparation of carbon nanotuhes and nanoparticles by microwave plasma enhanced chemical vapor deposition , Scripta Mater. 44 (2001) 1567-1570... 

Sharda, T., Soga, T., Jimbo, T. and Umeno, M. (2001), Growth of nanocrystaUine diamond films by biased enhanced microwave plasma chemical vapor deposition. Diam. Relat. Mater., 10(9-10) 1592-1596. 

Chemical vapor deposition refers to the formation of a nonvolatile solid material from the reaction of chemical reactants, called precursors, being in vapor phase in the right constituents. A reaction chamber is used for this process, into which the reactant gases are introduced to decompose and react with the substrate to form thin film or powders There are several main classification schemes for chemical vapor deposition processes. These include classification by the pressure (atmospheric, low-pressure, or ultrahigh vacuum), characteristics of the vapor (aerosol or direct liquid injection), or plasma processing type (microwave plasma-assisted deposition, plasma-enhanced deposition, remote plasma-enhanced deposition)... 

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