PECVD—See Plasma-enhanced chemical

PECVD. See Plasma-enhanced chemical vapor deposition. 

Chemical vapor deposition (CVD) process, 5 803-813,13 386 16 173, 531 17 209 22 129 23 7, 59 24 743-744 25 373. See also CVD entries Plasma-enhanced chemical vapor deposition (PECVD) Vapor deposition catalyzed, 26 806 ceramics and, 5 663 common precursors and corresponding thin films grown, 5 805t in compound semiconductor processing, 22 188, 189... 

As one can see, among the various types of plasmas, the cold plasma is especially recognized as a promising tool on the road towards the search for new materials. The creation of such materials by the cold plasma technology can be carried out in two ways (Fig. 1). The first one is the deposition of completely new materials in the form of thin films, which is mainly accomplished by plasma polymerization processes (sometimes not quite correctly called plasma-enhanced chemical vapor deposition (PECVD)), and also, but relatively more rarely, by reactive sputtering processes. Thin-film materials with unusual... 

Plasma deposition The formation of a film by the use of a plasma to decompose or polymerize a precursor gas or vapor. See also Plasma-enhanced chemical vapor deposition (PECVD) Plasma polymerization. 

Low pressure CVD (LPCVD) (vacuum deposition processes) Chemical vapor deposition that is performed in a vacuum. Also called Sub-atmospheric CVD. See also Chemical vapor deposition Plasma-enhanced CVD (PECVD). 

Plasma-deposited films Films deposited from a plasma using a chemical vapor precursor gas or a monomer as a source of the deposited material. See also Chemical ion plating Plasma-enhanced CVD (PECVD) Plasma polymerization. 

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