Plasma glow-discharge

Vapor—vapor reactions (14,16,17) are responsible for the majority of ceramic powders produced by vapor-phase synthesis. This process iavolves heating two or more vapor species which react to form the desired product powder. Reactant gases can be heated ia a resistance furnace, ia a glow discharge plasma at reduced pressure, or by a laser beam. Titania [13463-67-7] Ti02, siUca, siUcon carbide, and siUcon nitride, Si N, are among some of the technologically important ceramic powders produced by vapor—vapor reactions. 

Two types of plasma are currently used in CVD glow-discharge plasma (non-isothermal) and arc plasma (isothermal). Their characteristics are summarized in Table 5.3 and are described in more detail in the following sections. 

In addition to the thermal CVD reactions described above, a glow discharge plasma at 480-650°C has been used to deposit HB2 from the mixed chlorides,... 

Variants of glow discharge plasmas have been used ... 

Sharma AK, GB Josephson, DM Cameron, SC Goheen (2000) Destruction of pentachlorophenol using glow discharge plasma process. Environ Sci Technol 34 2267-2272. 

Table I includes results concerning a-C(N) H film deposition by ECRRF dual plasmas [49]. Despite the higher ionization and fragmentation of ECRRF plasmas, the results obtained are similar to those of glow-discharge plasmas. This is also the case for deposition performed by highly ionized methods such as plasma beam deposition [39].

R.K. Marcus (ed.), Glow Discharge Plasmas in Analytical Spectroscopy, John Wiley Sons, Inc., New York, NY (2002). 

RFGD Radio-Frequency Glow-Discharge Plasma Deposition... 

Physical adsorption Oxidation by strong acids Glow-discharge plasma... 

Figure 7.95 Schematic illustration of interactions of glow-discharge plasma with solid surfaces. Reprinted, by permission, from M. S. Sheu, D. M. Hudson, and I. H. Loh, in Encyclopedic Handbook of Biomaterials and Bioengineering, Part A Materials, Vol. 1, p. 869. Copyright 1995 by Marcel Dekker, Inc.

Marcus, R. K. and Broekaert, J. A.C., Glow discharge plasmas in analytical spectroscopy (John Wiley Sons Ltd., Chichester, West Sussex, England, 2003). 

Table I. Properties of rf Glow Discharges (Plasmas) Used for Thin-Film Etching and Deposition...

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