Plasma-assisted chemical vapour

Oguri, K. and Ariai, T., Friction Coefficient of Si-C, Ti-C and Ge-C Coatings with Excess Carbon Formed by Plasma-assisted Chemical Vapour Deposition, Thin Solid Films, Vol. 208,1992, pp. 158-160. 

A. T. Collins, M. Kamo, and Y. Sato, Optical centres related to nitrogen, vacancies and interstitials in polycrystalline diamond films grown by plasma-assisted chemical vapour deposition, J. Phys. D Appl. Phys., 22(9) 1402-1405 (1989)... 

CVD or PACVD (plasma assisted chemical vapour deposition). Here, the advantages... 

Table 28.3 Data from Veprek, S. (1985) Plasma-induced and plasma-assisted chemical vapour deposition, Thin Solid Films 130, 135.

Taschner, C. Leonhardt, A. Schonherr, M. Wolf, E. Henke, J. (1991). Structure and Properties of TiC Layers Prepared by Plasma-Assisted Chemical Vapour Deposition Methods. Mater, Sci Eng, A, Vol. 139, pp. 67-70 Thery, J. Martin, S. Faucheux, V. Le Van Jodin, L. Truffier-Boutry, D. Martinent, A. Laurent, J.Y. (2010). Fluorinated Carboxylic Membranes Deposited by Plasma Enhanced Chemical Vapour deposition for Fuel Cell Applications. /, Power Sources, Vol. 195, pp. 5573-5580... 

Wierzchofi, T. Sobiecki, J.R. Krupa, D. (1993). The Formation of Ti(OCN) Layers Produced from Metal-Organic Compwtmds Using Plasma-Assisted Chemical Vapour Deposition. Surf. Coat Technol., Vol. 59, pp. 217-220 Xinyao, Y. Zhongqing, J. Yuedong, M (2010). Effects of Sputtering Parameters on the Performance of Sputtered Cathodes for Direct Methanol Fuel Cells. Plasma Sci. Technol, Vol. 12, pp. 87-91... 

All-weather solar cells, and the effect of post-plasma enhanced chemical vapour deposition photo-assisted annealing on multicrystalline silicon solar cells have been discussed. ... 

Several attempts have been made to synthesize thin film C3N4, be it cubic or hexagonal. These include reactive magnetron sputtering [184-187], laser ablation [188] ion beam assisted deposition (IBAD) [189], plasma [191, 192] and plasma-enhanced chemical vapour deposition [190]. 

As noted above, amorphous carbon films can be produced from carbon-containing gas phases (physical vapour deposition, PVD). They can also be produced from hydrocarbon-containing gases (chemical vapour deposition, CVD), Both PVD and CVD processes can be thermally-activated or can be plasma- and/or electric field-assisted processes (e.g., microwave assisted CVD and ion beam deposition). As a consequence a wide range of processes have been developed to form amorphous carbon films and a correspondingly complex nomenclature has evolved [70, 71],... 

Pai, M. P., Musale, D. V. and Kshirsagar, S. T. (1998), Low-pressure chemical vapour deposition of diamond films in a radio-frequency plasma-assisted hot-filament reactor. Diam. Relat. Mater., 7(10) 1526-1533. 

Other processes investigated for planar SOFC fabrication include electrostatic-assisted vapour deposition, vapour phase electrolytic deposition, vacuum evaporation, laser spraying, transfer printing, sedimentation method, and plasma metal organic chemical vapour deposition. 

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