Expanding thermal plasma chemical vapor

Expanding Thermal Plasma Chemical Vapor Deposition. 163... 

The expanding thermal plasma chemical vapor deposition (ETP CVD) technique has been developed in the group of Schram [20, 556] and has been used for the... 

A promising alternative is surface textured doped zinc oxide films. ZnO films can offer excellent transparency and are highly resistant to hydrogen plasmas [78]. Textured ZnO films have been prepared by several deposition techniques. Examples are boron doped zinc oxide (ZnO B) prepared by low-pressure chemical vapor deposition (LPCVD) ([79,80], see also Chap. 6) or ZnO films deposited by expanding thermal plasma CVD [81], Quite recently, ZnO films for back contacts of solar modules have been developed using chemical bath deposition [82]. 

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