Temperature processing

In other work, the impact of thermal processing on linewidth variation was examined and interpreted in terms of how the resist s varying viscoelastic properties influence acid diffusion (105). The authors observed two distinct behaviors, above and below the resist film s glass transition. For example, a plot of the rate of deprotection as a function of post-exposure processing temperature show a change in slope very close to the T of the resist. Process latitude was improved and linewidth variation was naininiized when the temperature of post-exposure processing was below the film s T. 

Results obtained for two mixed plastics are summarized in Table 4. A balance exists between process temperature, plastics feed rate, and product yields (67). For example, lower temperatures increase wax formation due to incomplete depolymerization. Slower feed rates and increased residence times reduce wax formation and increase the yield of Hquids. The data summarized in Table 4 illustrate that the addition of PET to a HDPE PP PS mixture changes the performance of the Conrad process. Compared to the reference HDPE PP PS mixture, increased amounts of soHds ate formed. These are 95% terephthahc acid and 5% mono- and bis-hydroxyethyl esters. At higher temperatures, apparentiy enough water remains to promote decarboxylation. 

The details of the commercial preparation of acetal homo- and copolymers are discussed later. One aspect of the polymerisation so pervades the chemistry of the resulting polymers that familiarity with it is a prerequisite for understanding the chemistry of the polymers, the often subde differences between homo- and copolymers, and the difficulties which had to be overcome to make the polymers commercially useful. The ionic polymerisations of formaldehyde and trioxane are equiUbrium reactions. Unless suitable measures are taken, polymer will begin to revert to monomeric formaldehyde at processing temperatures by depolymerisation (called unsipping) which begins at chain ends. 

Separation of Fatty Acids. Tall oil is a by-product of the pulp and paper manufacturiag process and contains a spectmm of fatty acids, such as palmitic, stearic, oleic, and linoleic acids, and rosia acids, such as abietic acid. The conventional refining process to recover these fatty acids iavolves iatensive distillation under vacuum. This process does not yield high purity fatty acids, and moreover, a significant degradation of fatty acids occurs because of the high process temperatures. These fatty and rosia acids can be separated usiag a UOP Sorbex process (93—99) (Tables 8 and 9). 

Thermal Stability. At processing temperatures in both the extraction and recovery plants the solvent should be completely stable to avoid expensive solvent losses contamination of the solvent by any solvent breakdown products must be avoided. 

Crimp. The tow is usually relaxed at this point. Relaxation is essential because it gready reduces the tendency for fibrillation and increases the dimensional stabiUty of the fiber. Relaxation also increases fiber elongation and improves dye diffusion rates. This relaxation can be done in-line on Superba equipment or in batches in an autoclave. Generally saturated steam is used because the moisture reduces the process temperatures required. Fiber shrinkage during relaxation ranges from 10 to 40% depending on the temperature used, the polymer composition used for the fiber, and the amount of prior orientation and relaxation. The amount of relaxation is also tailored to the intended apphcation of the fiber product. 

Hydrated metal oxides such as alumina hydrate are usually used alone because these are not synergistic with the halogens. They are useful ia apphcations ia which the halogens are excluded or low processing temperatures are used. 

Coloring and Decorating. Commercial pigments that are thermally stable at the resin processing temperature maybe used. Pigments maybe dry-blended with the resin, or ETFE pellets may be blended with color concentrates, which are available ia pellet form. 

A newer concept has been developed that is given the name mild gasification (33). It is not a gasification process in the tme sense of the word. The process temperature is some several hundred degrees lower, hence the term mild, than the usual gasification process temperature and the objective is not to produce a gaseous fuel but to produce a high value char (carbon) and Hquid products. Gas is produced, but to a lesser extent. 

High process temperatures generally not achievable by other means are possible when induction heating of a graphite susceptor is combined with the use of low conductivity high temperature insulation such as flake carbon interposed between the coil and the susceptor. Temperatures of 3000°C are routine for both batch or continuous production. Processes include purification, graphitization, chemical vapor deposition, or carbon vapor deposition to produce components for the aircraft and defense industry. Figure 7 illustrates a furnace suitable for the production of aerospace brake components in a batch operation. 

The separation of nitrogen from natural gas reHes on the differences between the boiling points of nitrogen (77.4 K) and methane (91.7 K) and involves the cryogenic distillation of a feed stream that has been preconditioned to very low levels of carbon dioxide, water vapor, and other constituents that would form soHds at the low processing temperatures. 

Melt Viscosity. Viscosities of resins at standard temperatures yield information about molecular weight and molecular weight distribution, as weU as valuable information with respect to appHcation logistics. Some customers prefer to receive resins in molten form. Melt viscosities help to determine the required temperature for a resin to be pumpable. Temperature—viscosity profiles are routinely suppHed to customers by resin manufacturers. In general, a molten viscosity of 1—1.1 Pa-s (1000—1100 cP) or less at process temperatures is convenient for the pumping and handling of molten resin. 

Lubricants. Process aids or lubricants promote smooth and rapid extmsion and calendering, prevent sticking to extmders or calender roUs, and impart good release properties to molding compounds. In some cases use of lubricants allow slightly lower processing temperatures (see Vinyl polymers). 

Sihcon dioxide properties depend on the techniques used for oxide growth. The index of refraction for dry oxides decreases when higher processing temperatures are used whereas the oxide density increases. 

Dielectric Film Deposition. Dielectric films are found in all VLSI circuits to provide insulation between conducting layers, as diffusion and ion implantation (qv) masks, for diffusion from doped oxides, to cap doped films to prevent outdiffusion, and for passivating devices as a measure of protection against external contamination, moisture, and scratches. Properties that define the nature and function of dielectric films are the dielectric constant, the process temperature, and specific fabrication characteristics such as step coverage, gap-filling capabihties, density stress, contamination, thickness uniformity, deposition rate, and moisture resistance (2). Several processes are used to deposit dielectric films including atmospheric pressure CVD (APCVD), low pressure CVD (LPCVD), or plasma-enhanced CVD (PECVD) (see Plasma technology). 

Polysilicon. Polysihcon is used as the gate electrode material in MOS devices, as a conducting material for multilevel metallization, and as contact material for devices having shallow junctions. It is prepared by pyrolyzing silane, SiH, at 575—650°C in a low pressure reactor. The temperature of the process affects the properties of the final film. Higher process temperatures increase the deposition rate, but degrade the uniformity of the layer. Lower temperatures may improve the uniformity, but reduce the throughput to an impractical level. 

Plasma sources are also being iatroduced to produce plasmas at lower pressures and process temperatures. Inductively coupled plasma (ICP) and transformer-coupled plasma (TCP) are among the more commonly used sources, operating below 2.6 Pa (20 mTorr) (42). Low temperature RIE processiag operates between 26—67 Pa (200—500 mTorr). 

Cultured buttermilk is that which is produced by the fermentation (qv) of skimmed milk often with some cream added. The principal fermentation organisms used are l ctococcus lactis suhsp. cremoris l ctococcus lactis suhsp. lactis and l euconostoc citrovorum. The effect of the high processing temperature and the lactic acid provide an easily digestible product. 

Low temperatures strongly favor the formation of nitrogen dioxide. Below 150°C equiUbrium is almost totally in favor of NO2 formation. This is a slow reaction, but the rate constant for NO2 formation rapidly increases with reductions in temperature. Process temperatures are typically low enough to neglect the reverse reaction and determine changes in NO partial pressure by the rate expression (40—42) (eq. 13). The rate of reaction, and therefore the... 

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