Linewidth variation

In other work, the impact of thermal processing on linewidth variation was examined and interpreted in terms of how the resist s varying viscoelastic properties influence acid diffusion (105). The authors observed two distinct behaviors, above and below the resist film s glass transition. For example, a plot of the rate of deprotection as a function of post-exposure processing temperature show a change in slope very close to the T of the resist. Process latitude was improved and linewidth variation was naininiized when the temperature of post-exposure processing was below the film s T. 

Nevertheless, the linewidth variations are in the order Cl> C2 C3>C4 for both coverages, a greater change being observed for the sample 0= 0.5. At high surface coverage, a phase transition occurs which will be discussed in a separate paper (34). 

Figure 3. Linewidth variation caused by overcut resist profiles.

With an MLR system, linewidth variations caused by resist thickness differences can be eliminated because of the planarization step. The reflections from either topographic structures or multiple film layers can be eliminated by using an absorbant material for the bottom layer. Either an inherently absorbant polymer material can be chosen or a dye can be added... 

Both the deep-UV-and the RIE PCM-delineated resist structures can be used for electroplating which was successfully demonstrated by Satini and Viswanathan 45) as shown in Figure 22 for the deep-UV PCM case. In this case the control of the image in the planarizing layer is critical. Because of the unique anisotropic characteristics of RIE, this control should also be feasible for RIE PCM. In such cases linewidth variations include the contribution from the planarizing layer as well as top layers. The consideration of resist removal after plating is similar to the case for lift-off. 

With any resist, the ideal conditions for obtaining high resolution and good linewidth control are a flat surface and a thin resist (<400 nm). The flat surface means that the resist will have very little variation in thickness and, as a result, there will be little variation in resist linewidth. However linewidth variations stemming from resist thickness variations do occur when lines traverse a step as a result of exposure and development effects. Indeed, such... 

Figure 2 Linewidth variations with scattering angle in several forms of trans-PA. The square of the fwhm of the observed (hkO) lines is plotted versus the fourth power of the scattering vector [see Eq. (2) in the text] (a) Shirakawa type, from Ref. 34 (b) Durham type, from Ref. 35 (c) Akagi type, from Ref. 19. (From Ref. 19.)...

Table I. Parameters appearing in linewidth variation of pseudoro tating K, Equation (10) of text.

Figure 7.33 indicates that erosion is not dependent on linewidth. Because a change in linewidth, given constant pattern density, does not decrease the pattern density of the SiOj supporting the load, a linewidth change can be expected to have little effect on the pressure exerted on the SiOj. Linewidth variations therefore have little effect on SiOj erosion. 

The rate constant ( ex) of the electron-exchange reaction between r-BuCeo and t-BuCeo was determined as 1.9 x 10 M s at 298 K by analyzing the linewidth variations of the ESR spectra [43], Although Ceo is perturbed by the t-Bu addend, the much larger value, compared with the value for the ferrocene/ferricenium exchange (5.3 x 10 s ), corroborates the high efficiency of electron transfer... 

The active aldehydes are derived from the reaction of 3-benzylthiazolium salts with o-tolualdehyde in the presence of DBU (l,8-diazabicyclo[5.4.0]undec-7-ene) via deprotonation of thiazolium salts, addition of the aldehyde and deprotonation of the adduct as shown in Scheme 33 [364], The anionic form of active aldehydes in Scheme 33 is confirmed by the direct detection of the one-electron oxidized species with use of ESR [364]. From the linewidth variations of the ESR spectra of the oxidized active aldehyde radicals were determined the rate constants [(5-7) x 10 s ] and the corresponding small reorganization energies (A = 12-13... 

A1-NMR characterizes aluminium species of different coordination (tetra- or octahedralkand their interaction with the surroundings. Quantification of Al-n.m.r. measurements can be achieved in well-defined conditions. The nature of the species resulting from dealumination can be inferred by studying the chemical shift and linewidth variations of the observed resonances. 

Bandheads are prominent features of a Loomis-Wood plot. A family of straight and curved lines emanates from the bandhead of the mapped branch on the Loomis-Wood plot. The straight lines actually intersect at the bandhead and correspond to various orders of the mapped branch. The curved lines are generated e.g. when the post-head R-branch overlaps with the pre-head segment of itself or with the P-branch described by the same Fortrat equation. Another prominent feature of Loomis-Wood plots is a horizontal strip free of points, which surrounds the mapped branch. The width of this strip is determined by the widths of lines in the mapped branch (instrumental resolution, Doppler width, nonradiative decay width, or unresolved hyperfine splittings). The Loomis-Wood plot can provide a survey map of J-dependent linewidth variations that encode valuable information about unimolecular dynamics. 

Figure 7.22 Schematic illustration of the variation of T versus v and J. The dashed and dotted lines correspond, respectively, to the minima and maxima of the level widths, except for the first dashed line, which corresponds to the inflection points for the first maximum of the linewidth variation. The T curve depicts the variation of the linewidth at Jmax versus energy. The solid lines correspond to rotational levels of successive v levels of the bound state. The points, A and Oi are the observed locations of linewidth minima and maxima. [Courtesy of M.S. Child.]...

Figure 7.41 Linewidth variation in the OH A2 + (v = 8) level for the resolved F and 1 2 spin components. The solid lines represent the experimental data of Czarny and Felenbok (1968). The dotted line shows the calculated linewidths from Czarny, et ol.(1971).

We have used high salt buffers throughout the biilk of ovur work in order to avoid electrostatic Interactions, The value of 0.1 M KCl was chosen in light of the results of Paper II ( ) which showed linewidth variations when the salt content of the buffer was changed from 0 to IM. Above O.Um no changes were observed. 

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