Spectroscopy surface analysis

Photoelectron spectroscopy provides a direct measure of the filled density of states of a solid. The kinetic energy distribution of the electrons that are emitted via the photoelectric effect when a sample is exposed to a monocluomatic ultraviolet (UV) or x-ray beam yields a photoelectron spectrum. Photoelectron spectroscopy not only provides the atomic composition, but also infonnation conceming the chemical enviromnent of the atoms in the near-surface region. Thus, it is probably the most popular and usefiil surface analysis teclmique. There are a number of fonus of photoelectron spectroscopy in conuuon use. 

Sharma A and Khatri R K 1995 Surface analysis optical spectroscopy Encyciopedia of Anaiyticai Science ed A Townshend (London Academic) 8 4958-65... 

Czanderna A Wand Flercules D M (ed) 1991 Ion Spectroscopies for Surface Analysis (New York Plenum)... 

Briggs D and Seah M P (eds) 1983 Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (New York Wiley)... 

Briggs, D. (Ed.) (1994) Practical Surface Analysis Auger and X-ray Photoelectron Spectroscopy, John Wiley, Chichester. 

Analysis of Surface Elemental Composition. A very important class of surface analysis methods derives from the desire to understand what elements reside at the surface or in the near-surface region of a material. The most common techniques used for deterrnination of elemental composition are the electron spectroscopies in which electrons or x-rays are used to stimulate either electron or x-ray emission from the atoms in the surface (or near-surface region) of the sample. These electrons or x-rays are emitted with energies characteristic of the energy levels of the atoms from which they came, and therefore, contain elemental information about the surface. Only the most important electron spectroscopies will be discussed here, although an array of techniques based on either the excitation of surfaces with or the collection of electrons from the surface have been developed for the elucidation of specific information about surfaces and interfaces. 

Analytical Atomic Spectroscopy Surface Analysis," Mnnual Book ofMSTM Standards, part 3.06, American Society for Testing and Matedals, Philadelphia, Pa., 1992. 

For a review of how defects manifest themselves in a LEED experiment, see M. Henzler. In Electron Spectroscopy for Surface Analysis. (H. I. Ibach, ed.) Springer, Berlin, 1977. 

Ion Scattering Spectroscopy (ISS) is one of the most powerful and practical methods of surface analysis available. However, it is undemtilized due to a lack of understanding about its application and capabilities. This stems from its history, the limited number of high-performance instmments manufactured, and the small number of experienced surface scientists who have actually used ISS in extensive applications. Ironically, it is one of the easiest and most convenient sur ce analytical instruments to use and it provides usehil information for almost any type of solid material. 

In other articles in this section, a method of analysis is described called Secondary Ion Mass Spectrometry (SIMS), in which material is sputtered from a surface using an ion beam and the minor components that are ejected as positive or negative ions are analyzed by a mass spectrometer. Over the past few years, methods that post-ion-ize the major neutral components ejected from surfaces under ion-beam or laser bombardment have been introduced because of the improved quantitative aspects obtainable by analyzing the major ejected channel. These techniques include SALI, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS), and Sputtered Neutral Mass Spectrometry (SNMS) or electron-gas post-ionization. Post-ionization techniques for surface analysis have received widespread interest because of their increased sensitivity, compared to more traditional surface analysis techniques, such as X-Ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES), and their more reliable quantitation, compared to SIMS. 

Sputter-Initiated Resonance Ionization Spectroscopy Surface Analysis by Resonant Ionization Spectroscopy Time-of-Flight Mass Spectrometer... 

X-ray photoelectron spectroscopy (XPS) is currently the most widely used surface-analytical technique, and is therefore described here in more detail than any of the other techniques. At its inception hy Sieghahn and coworkers [2.1] it was called ESCA (electron spectroscopy for chemical analysis), hut the name ESCA is now considered too general, because many surface-electron spectroscopies exist, and the name given to each one must be precise. The name ESCA is, nevertheless, still used in many places, particularly in industrial laboratories and their publications. Briefly, the reasons for the popularity of XPS are the exceptional combination of compositional and chemical information that it provides, its ease of operation, and the ready availability of commercial equipment. 

Because the Raman cross-section of molecules is usually low, intense light sources and low-noise detectors must be used, and high sensitivities - as required for surface analysis - are difficult to achieve. Different approaches, singly and in combination, enable the detection of Raman spectroscopy bands from surfaces. 

Recent developments in Raman equipment has led to a considerable increase in sensitivity. This has enabled the monitoring of reactions of organic monolayers on glassy carbon [4.292] and diamond surfaces and analysis of the structure of Lang-muir-Blodgett monolayers without any enhancement effects. Although this unenhanced surface-Raman spectroscopy is expected to be applicable to a variety of technically or scientifically important surfaces and interfaces, it nevertheless requires careful optimization of the apparatus, data treatment, and sample preparation. 

J. P. Watts An Introduetion to Surface Analysis by Electron Spectroscopy, Oxford University Press, Oxford 1990. 

Surface analysis has made enormous contributions to the field of adhesion science. It enabled investigators to probe fundamental aspects of adhesion such as the composition of anodic oxides on metals, the surface composition of polymers that have been pretreated by etching, the nature of reactions occurring at the interface between a primer and a substrate or between a primer and an adhesive, and the orientation of molecules adsorbed onto substrates. Surface analysis has also enabled adhesion scientists to determine the mechanisms responsible for failure of adhesive bonds, especially after exposure to aggressive environments. The objective of this chapter is to review the principals of surface analysis techniques including attenuated total reflection (ATR) and reflection-absorption (RAIR) infrared spectroscopy. X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and secondary ion mass spectrometry (SIMS) and to present examples of the application of each technique to important problems in adhesion science. 

Infrared spectroscopy, including Fourier-transform infrared (FTIR) spectroscopy, is one of the oldest techniques used for surface analysis. ATR has been used for many years to probe the surface composition of polymers that have been surface-modified by an etching process or by deposition of a film. RAIR has been widely used to characterize thin films on the surfaces of specular reflecting substrates. FTIR has numerous characteristics that make it an appropriate technique for... 

As indicated above, the penetration depth is on the order of a micrometer. That means that in ATR, absorption of infrared radiation mostly occurs within a distance 8 of the surface and ATR is not as surface sensitive as some other surface analysis techniques. However, ATR, like all forms of infrared spectroscopy, is very sensitive to functional groups and is a powerful technique for characterizing the surface regions of polymers. 

The interface properties can usually be independently measured by a number of spectroscopic and surface analysis techniques such as secondary ion mass spectroscopy (SIMS), X-ray photoelectron spectroscopy (XPS), specular neutron reflection (SNR), forward recoil spectroscopy (FRES), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), infrared (IR) and several other methods. Theoretical and computer simulation methods can also be used to evaluate H t). Thus, we assume for each interface that we have the ability to measure H t) at different times and that the function is well defined in terms of microscopic properties. 

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